Enhancement of field emission of the zno film by the reduced work function and the increased conductivity via hydrogen plasma treatment
文献类型：期刊论文
| 作者 | You, J. B.1; Zhang, X. W.1; Cai, P. F.1; Dong, J. J.1; Gao, Y.1; Yin, Z. G.1; Chen, N. F.1; Wang, R. Z.2; Yan, H.2 |
| 刊名 | Applied physics letters
 |
| 出版日期 | 2009-06-29 |
| 卷号 | 94期号:26页码:3 |
| 关键词 | Atomic force microscopy Field emission Hydrogen Ii-vi semiconductors Plasma materials processing Sputter deposition Wide band gap semiconductors Work function Zinc compounds |
| ISSN号 | 0003-6951 |
| DOI | 10.1063/1.3167301 |
| 通讯作者 | Zhang, x. w.(xwzhang@semi.ac.cn) |
| 英文摘要 | The zno films deposited by magnetron sputtering were treated by h/o plasma. it is found that the field emission (fe) characteristics of the zno film are considerably improved after h-plasma treatment and slightly deteriorated after o-plasma treatment. the improvement of fe characteristics is attributed to the reduced work function and the increased conductivity of the zno:h films. conductive atomic force microscopy was employed to investigate the effect of the plasma treatment on the nanoscale conductivity of zno, these findings correlate well with the fe data and facilitate a clearer description of electron emission from the zno:h films. |
| WOS关键词 | THIN-FILMS ; NANORODS ; SURFACE |
| WOS研究方向 | Physics |
| WOS类目 | Physics, Applied |
| 语种 | 英语 |
| WOS记录号 | WOS:000267697300022 |
| 出版者 | AMER INST PHYSICS |
| URI标识 | http://www.irgrid.ac.cn/handle/1471x/2427736 |
| 专题 | 半导体研究所 |
| 通讯作者 | Zhang, X. W. |
| 作者单位 | 1.Chinese Acad Sci, Inst Semicond, Key Lab Semicond Mat Sci, Beijing 100083, Peoples R China 2.Beijing Univ Technol, Lab Thin Film Mat, Coll Mat Sci & Engn, Beijing 100022, Peoples R China |
| 推荐引用方式 GB/T 7714 | You, J. B.,Zhang, X. W.,Cai, P. F.,et al. Enhancement of field emission of the zno film by the reduced work function and the increased conductivity via hydrogen plasma treatment[J]. Applied physics letters,2009,94(26):3. |
| APA | You, J. B..,Zhang, X. W..,Cai, P. F..,Dong, J. J..,Gao, Y..,...&Yan, H..(2009).Enhancement of field emission of the zno film by the reduced work function and the increased conductivity via hydrogen plasma treatment.Applied physics letters,94(26),3. |
| MLA | You, J. B.,et al."Enhancement of field emission of the zno film by the reduced work function and the increased conductivity via hydrogen plasma treatment".Applied physics letters 94.26(2009):3. |
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来源：半导体研究所
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