中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Fabrication of gan nanowires by ammoniating ga2o3/nicl2 films deposited on si substrates

文献类型:期刊论文

作者Xue, Chengshan; Wang, Ying; Zhuang, Huizhao; Wang, Zouping; Huang, Yinglong; Zhang, Dongdong; Cao, Yuping
刊名Journal of alloys and compounds
出版日期2009-09-18
卷号484期号:1-2页码:33-35
关键词Single crystal growth Chemical vapor deposition processes Nanomaterials
ISSN号0925-8388
DOI10.1016/j.jallcom.2009.05.086
通讯作者Xue, chengshan(xuechengshan@sdnu.edu.cn)
英文摘要Gan nanowires were synthesized successfully through ammoniating ga2o3/nicl2 films deposited on the unpolished si substrate. x-ray diffraction (xrd), scanning electron microscopy (sem), high-resolution transmission electron microscope (hrtem) and fourier transformed infrared spectra (ftir) are used to characterize the samples. the results demonstrate that the nanowires are single-crystal gan with hexagonal wurtzite structure. the growth mechanism of gan nanowires is also discussed. (c) 2009 elsevier b.v. all rights reserved.
WOS关键词LIGHT-EMITTING-DIODES ; GALLIUM NITRIDE ; ABSORPTION ; NANORODS ; CARBON
WOS研究方向Chemistry ; Materials Science ; Metallurgy & Metallurgical Engineering
WOS类目Chemistry, Physical ; Materials Science, Multidisciplinary ; Metallurgy & Metallurgical Engineering
语种英语
WOS记录号WOS:000271334900009
出版者ELSEVIER SCIENCE SA
URI标识http://www.irgrid.ac.cn/handle/1471x/2427784
专题半导体研究所
通讯作者Xue, Chengshan
作者单位Shandong Normal Univ, Coll Phys & Elect, Inst Semicond, Jinan 250014, Peoples R China
推荐引用方式
GB/T 7714
Xue, Chengshan,Wang, Ying,Zhuang, Huizhao,et al. Fabrication of gan nanowires by ammoniating ga2o3/nicl2 films deposited on si substrates[J]. Journal of alloys and compounds,2009,484(1-2):33-35.
APA Xue, Chengshan.,Wang, Ying.,Zhuang, Huizhao.,Wang, Zouping.,Huang, Yinglong.,...&Cao, Yuping.(2009).Fabrication of gan nanowires by ammoniating ga2o3/nicl2 films deposited on si substrates.Journal of alloys and compounds,484(1-2),33-35.
MLA Xue, Chengshan,et al."Fabrication of gan nanowires by ammoniating ga2o3/nicl2 films deposited on si substrates".Journal of alloys and compounds 484.1-2(2009):33-35.

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来源:半导体研究所

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