中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
High resistance algaas/gaas quantum cascade detectors grown by solid source molecular beam epitaxy operating above liquid nitrogen temperature

文献类型:期刊论文

作者Liu, Junqi; Kong, Ning; Li, Lu; Liu, Fengqi; Wang, Lijun; Chen, Jianyan; Wang, Zhanguo
刊名Semiconductor science and technology
出版日期2010-07-01
卷号25期号:7页码:4
ISSN号0268-1242
DOI10.1088/0268-1242/25/7/075011
通讯作者Liu, junqi(jqliu@semi.ac.cn)
英文摘要Quantum cascade detectors in the algaas/gaas material system have been grown by solid source molecular beam epitaxy. the growth direction of the active region is chosen carefully due to the existence of a doping concentration grade along the epilayers. for a 200 x 200 mu m(2) square mesa device, the detector operates above 90 k with a peak detection wavelength of 8.81 mu m, and exhibits a high r(0)a about 4.5 x 10(6) omega cm(2) and a high johnson noise limited detectivity d-j* about 3.9 x 10(10) jones at this temperature.
WOS关键词WELL INFRARED PHOTODETECTORS
WOS研究方向Engineering ; Materials Science ; Physics
WOS类目Engineering, Electrical & Electronic ; Materials Science, Multidisciplinary ; Physics, Condensed Matter
语种英语
WOS记录号WOS:000279319600011
出版者IOP PUBLISHING LTD
URI标识http://www.irgrid.ac.cn/handle/1471x/2427795
专题半导体研究所
通讯作者Liu, Junqi
作者单位Chinese Acad Sci, Inst Semicond, Key Lab Semicond Mat Sci, Beijing 100083, Peoples R China
推荐引用方式
GB/T 7714
Liu, Junqi,Kong, Ning,Li, Lu,et al. High resistance algaas/gaas quantum cascade detectors grown by solid source molecular beam epitaxy operating above liquid nitrogen temperature[J]. Semiconductor science and technology,2010,25(7):4.
APA Liu, Junqi.,Kong, Ning.,Li, Lu.,Liu, Fengqi.,Wang, Lijun.,...&Wang, Zhanguo.(2010).High resistance algaas/gaas quantum cascade detectors grown by solid source molecular beam epitaxy operating above liquid nitrogen temperature.Semiconductor science and technology,25(7),4.
MLA Liu, Junqi,et al."High resistance algaas/gaas quantum cascade detectors grown by solid source molecular beam epitaxy operating above liquid nitrogen temperature".Semiconductor science and technology 25.7(2010):4.

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来源:半导体研究所

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