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A study of indium incorporation in in-rich ingan grown by movpe

文献类型:期刊论文

作者Guo, Y.; Liu, X. L.; Song, H. P.; Yang, A. L.; Xu, X. Q.; Zheng, G. L.; Wei, H. Y.; Yang, S. Y.; Zhu, Q. S.; Wang, Z. G.
刊名Applied surface science
出版日期2010-03-01
卷号256期号:10页码:3352-3356
关键词Movpe In-rich ingan Indium incorporation
ISSN号0169-4332
DOI10.1016/j.apsusc.2009.11.081
通讯作者Guo, y.(guoyan@semi.ac.cn)
英文摘要Ingan/gan heterostructures have been deposited onto (0 0 0 1) sapphire by our home-made low pressure movpe with different growth parameters. it has been noted that the indium incorporation depends by a complex way on a number of factors. in this work, the effect of substrate temperature, trimethylindium input flow and v/iii ratio on the indium incorporation has been investigated. finally, by optimizing the growth parameters, we made a series of single-phase ingan samples with indium content from 10% up to 45%. (c) 2009 elsevier b.v. all rights reserved.
WOS关键词MOLECULAR-BEAM EPITAXY ; CHEMICAL-VAPOR-DEPOSITION ; CRITICAL THICKNESS ; DROPLET FORMATION ; PHASE-SEPARATION ; TEMPERATURE ; FILMS ; HETEROSTRUCTURES ; IMMISCIBILITY ; INXGA1-XN
WOS研究方向Chemistry ; Materials Science ; Physics
WOS类目Chemistry, Physical ; Materials Science, Coatings & Films ; Physics, Applied ; Physics, Condensed Matter
语种英语
WOS记录号WOS:000275233900062
出版者ELSEVIER SCIENCE BV
URI标识http://www.irgrid.ac.cn/handle/1471x/2427888
专题半导体研究所
通讯作者Guo, Y.
作者单位Chinese Acad Sci, Inst Semicond, Key Lab Semicond Mat Sci, Beijing 100083, Peoples R China
推荐引用方式
GB/T 7714
Guo, Y.,Liu, X. L.,Song, H. P.,et al. A study of indium incorporation in in-rich ingan grown by movpe[J]. Applied surface science,2010,256(10):3352-3356.
APA Guo, Y..,Liu, X. L..,Song, H. P..,Yang, A. L..,Xu, X. Q..,...&Wang, Z. G..(2010).A study of indium incorporation in in-rich ingan grown by movpe.Applied surface science,256(10),3352-3356.
MLA Guo, Y.,et al."A study of indium incorporation in in-rich ingan grown by movpe".Applied surface science 256.10(2010):3352-3356.

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来源:半导体研究所

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