Fabrication of a low-loss ssc using high-dose electron beam lithography exposure with negative pmma resist
文献类型：期刊论文
| 作者 | Liu, Yan; Xu, Xuejun; Xing, Bo; Yu, Yude; Yu, Jinzhong |
| 刊名 | Ieee photonics technology letters
 |
| 出版日期 | 2010-04-01 |
| 卷号 | 22期号:7页码:501-503 |
| 关键词 | Silicon-on-insulator (soi) Spot-size converter (ssc) |
| ISSN号 | 1041-1135 |
| DOI | 10.1109/lpt.2010.2040998 |
| 通讯作者 | Liu, yan(liuyan@semi.ac.cn) |
| 英文摘要 | A silicon-on-insulator optical fiber-to-waveguide spot-size converter (ssc) using poly-methylmethacrylate (pmma) is presented for integrated optical circuits. unlike the conventional use of pmma as a positive resist, it has been successfully used as a negative resist with high-dose electron exposure for the fabrication of ultrafine silicon wire waveguides. additionally, this process is able to reduce the side-wall roughness, and substantially depresses the unwanted propagation loss. exploiting this technology, the authors demonstrated that the ssc can improve coupling efficiency by as much as over 2.5 db per coupling facet, compared with that of ssc fabricated with pmma as a positive resist with the same dimension. |
| WOS关键词 | POLY(METHYLMETHACRYLATE) RESIST ; WAVE-GUIDES ; SILICON ; CIRCUIT ; FIBERS ; LINES |
| WOS研究方向 | Engineering ; Optics ; Physics |
| WOS类目 | Engineering, Electrical & Electronic ; Optics ; Physics, Applied |
| 语种 | 英语 |
| WOS记录号 | WOS:000275370700010 |
| 出版者 | IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC |
| URI标识 | http://www.irgrid.ac.cn/handle/1471x/2427915 |
| 专题 | 半导体研究所 |
| 通讯作者 | Liu, Yan |
| 作者单位 | Chinese Acad Sci, Inst Semicond, State Key Lab Optoelect, Beijing 100083, Peoples R China |
| 推荐引用方式 GB/T 7714 | Liu, Yan,Xu, Xuejun,Xing, Bo,et al. Fabrication of a low-loss ssc using high-dose electron beam lithography exposure with negative pmma resist[J]. Ieee photonics technology letters,2010,22(7):501-503. |
| APA | Liu, Yan,Xu, Xuejun,Xing, Bo,Yu, Yude,&Yu, Jinzhong.(2010).Fabrication of a low-loss ssc using high-dose electron beam lithography exposure with negative pmma resist.Ieee photonics technology letters,22(7),501-503. |
| MLA | Liu, Yan,et al."Fabrication of a low-loss ssc using high-dose electron beam lithography exposure with negative pmma resist".Ieee photonics technology letters 22.7(2010):501-503. |
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来源：半导体研究所
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