中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Strong circular photogalvanic effect in zno epitaxial films

文献类型:期刊论文

作者Zhang, Q.1; Wang, X. Q.1; Yin, C. M.1; Xu, F. J.1; Tang, N.1; Shen, B.1; Chen, Y. H.2; Chang, K.2; Ge, W. K.3; Ishitani, Y.4
刊名Applied physics letters
出版日期2010-07-26
卷号97期号:4页码:3
关键词Ii-vi semiconductors Photoconductivity Photovoltaic effects Semiconductor epitaxial layers Spin-orbit interactions Valence bands Wide band gap semiconductors Zinc compounds
ISSN号0003-6951
DOI10.1063/1.3467835
通讯作者Zhang, q.()
英文摘要We report a strong circular photogalvanic effect (cpge) in zno epitaxial films under interband excitation. it is observed that cpge current is as large as 100 na/w in zno, which is about one order in magnitude higher than that in inn film while the cpge currents in gan films are not detectable. the possible reasons for the above observations are the strong spin orbit coupling in zno or the inversed valence band structure of zno. (c) 2010 american institute of physics. [doi:10.1063/1.3467835]
WOS关键词BAND-STRUCTURE ; QUANTUM-WELLS ; SEMICONDUCTORS ; SPIN ; INN
WOS研究方向Physics
WOS类目Physics, Applied
语种英语
WOS记录号WOS:000281059200027
出版者AMER INST PHYSICS
URI标识http://www.irgrid.ac.cn/handle/1471x/2427953
专题半导体研究所
通讯作者Zhang, Q.
作者单位1.Peking Univ, Sch Phys, State Key Lab Artificial Microstruct & Mesoscop P, Beijing 100871, Peoples R China
2.CAS, Inst Semicond, Lab Semicond Mat Sci, Beijing 100083, Peoples R China
3.Tsinghua Univ, Dept Phys, Beijing 100871, Peoples R China
4.Chiba Univ, Dept Elect & Elect Engn, Inage Ku, Chiba 2638522, Japan
推荐引用方式
GB/T 7714
Zhang, Q.,Wang, X. Q.,Yin, C. M.,et al. Strong circular photogalvanic effect in zno epitaxial films[J]. Applied physics letters,2010,97(4):3.
APA Zhang, Q..,Wang, X. Q..,Yin, C. M..,Xu, F. J..,Tang, N..,...&Yoshikawa, A..(2010).Strong circular photogalvanic effect in zno epitaxial films.Applied physics letters,97(4),3.
MLA Zhang, Q.,et al."Strong circular photogalvanic effect in zno epitaxial films".Applied physics letters 97.4(2010):3.

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来源:半导体研究所

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