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Chinese Academy of Sciences Institutional Repositories Grid
Valence band offset of mgo/tio2 (rutile) heterojunction measured by x-ray photoelectron spectroscopy

文献类型:期刊论文

作者Zheng, Gaolin; Wang, Jun; Liu, Xianglin; Yang, Anli; Song, Huaping; Guo, Yan; Wei, Hongyuan; Jiao, Chunmei; Yang, Shaoyan; Zhu, Qinsheng
刊名Applied surface science
出版日期2010-09-15
卷号256期号:23页码:7327-7330
关键词Mgo Rutile Band offset X-ray photoelectron spectroscopy Gate dielectric Dye-sensitized solar cells
ISSN号0169-4332
DOI10.1016/j.apsusc.2010.05.074
通讯作者Zheng, gaolin(zhenggl@semi.ac.cn)
英文摘要The valence band offset (vbo) of mgo/tio2 (rutile) heterojunction has been directly measured by xray photoelectron spectroscopy. the vbo of the heterojunction is determined to be 1.6 +/- 0.3 ev and the conduction band offset (cbo) is deduced to be 3.2 +/- 0.3 ev, indicating that the heterojunction exhibits a type-i band alignment. these large values are sufficient for mgo to act as tunneling barriers in tio2 based devices. the accurate determination of the valence and conduction band offsets is important for use of mgo as a buffer layer in tio2 based field-effect transistors and dye-sensitized solar cells. (c) 2010 elsevier b. v. all rights reserved.
WOS关键词SENSITIZED SOLAR-CELLS ; TITANIUM-DIOXIDE ; SIO2/SI SYSTEM ; OXIDE ; MGO ; EFFICIENCY ; SURFACES ; FILMS ; PHOTOCATALYSIS ; ENHANCEMENT
WOS研究方向Chemistry ; Materials Science ; Physics
WOS类目Chemistry, Physical ; Materials Science, Coatings & Films ; Physics, Applied ; Physics, Condensed Matter
语种英语
WOS记录号WOS:000279592200065
出版者ELSEVIER SCIENCE BV
URI标识http://www.irgrid.ac.cn/handle/1471x/2427963
专题半导体研究所
通讯作者Zheng, Gaolin
作者单位Chinese Acad Sci, Key Lab Semicond Mat Sci, Inst Semicond, Beijing 100083, Peoples R China
推荐引用方式
GB/T 7714
Zheng, Gaolin,Wang, Jun,Liu, Xianglin,et al. Valence band offset of mgo/tio2 (rutile) heterojunction measured by x-ray photoelectron spectroscopy[J]. Applied surface science,2010,256(23):7327-7330.
APA Zheng, Gaolin.,Wang, Jun.,Liu, Xianglin.,Yang, Anli.,Song, Huaping.,...&Wang, Zhanguo.(2010).Valence band offset of mgo/tio2 (rutile) heterojunction measured by x-ray photoelectron spectroscopy.Applied surface science,256(23),7327-7330.
MLA Zheng, Gaolin,et al."Valence band offset of mgo/tio2 (rutile) heterojunction measured by x-ray photoelectron spectroscopy".Applied surface science 256.23(2010):7327-7330.

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来源:半导体研究所

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