Flat surface plasmon polariton bands in bragg grating waveguide for slow light
文献类型:期刊论文
作者 | Zhang, Jing1,2; Cai, Likang1; Bai, Wenli1; Song, Guofeng1 |
刊名 | Journal of lightwave technology
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出版日期 | 2010-07-15 |
卷号 | 28期号:14页码:2030-2036 |
关键词 | Grating Plasmons Slow light Waveguide |
ISSN号 | 0733-8724 |
DOI | 10.1109/jlt.2010.2051320 |
通讯作者 | Zhang, jing(gcrrr@semi.ac.cn) |
英文摘要 | The formations of the surface plasmon polariton (spp) bands in metal/air/metal (mam) sub-wavelength plasmonic grating waveguide (pgw) are proposed. the band gaps originating from the highly localized resonances inside the grooves can be simply estimated from the round trip phase condition. due to the overlap of the localized spps between the neighboring grooves, a bloch mode forms in the bandgap and can be engineered to build a very flat dispersion for slow light. a chirped pgw with groove depth varying is also demonstrated to trap light, which is validated by finite-difference time-domain (fdtd) simulations with both continuous and pulse excitations. |
WOS关键词 | PROPAGATION ; FREQUENCIES ; STORAGE |
WOS研究方向 | Engineering ; Optics ; Telecommunications |
WOS类目 | Engineering, Electrical & Electronic ; Optics ; Telecommunications |
语种 | 英语 |
WOS记录号 | WOS:000283057800001 |
出版者 | IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC |
URI标识 | http://www.irgrid.ac.cn/handle/1471x/2428038 |
专题 | 半导体研究所 |
通讯作者 | Zhang, Jing |
作者单位 | 1.Chinese Acad Sci, Inst Semicond, Beijing 100083, Peoples R China 2.Tsinghua Univ, Dept Elect Engn, Beijing 100083, Peoples R China |
推荐引用方式 GB/T 7714 | Zhang, Jing,Cai, Likang,Bai, Wenli,et al. Flat surface plasmon polariton bands in bragg grating waveguide for slow light[J]. Journal of lightwave technology,2010,28(14):2030-2036. |
APA | Zhang, Jing,Cai, Likang,Bai, Wenli,&Song, Guofeng.(2010).Flat surface plasmon polariton bands in bragg grating waveguide for slow light.Journal of lightwave technology,28(14),2030-2036. |
MLA | Zhang, Jing,et al."Flat surface plasmon polariton bands in bragg grating waveguide for slow light".Journal of lightwave technology 28.14(2010):2030-2036. |
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来源:半导体研究所
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