Highly reproducible nanolithography by dynamic plough of an atomic-force microscope tip and thermal-annealing treatment
文献类型：期刊论文
| 作者 | Lu, Xiaofeng1; Balocco, Claudio1; Yang, Fuhua2; Song, Aimin M.1 |
| 刊名 | Ieee transactions on nanotechnology
 |
| 出版日期 | 2011 |
| 卷号 | 10期号:1页码:53-58 |
| 关键词 | Atomic-force microscope (afm) Nanolithography Self-switching diodes (ssds) 2-d electron gas |
| ISSN号 | 1536-125X |
| DOI | 10.1109/tnano.2010.2053045 |
| 通讯作者 | Lu, xiaofeng(xiaofeng.lu@manchester.ac.uk) |
| 英文摘要 | An approach has been developed to use atomic-force microscope (afm) to pattern materials at the nanoscale in a controlled manner. by introducing a thermal-annealing process above the glass-transition temperature of poly (methylmethacrylate) (pmma), the profile of indented nanopatterns has been dramatically improved by abatement of the tip-induced debris. this eliminates the main problem of the previous afm-based tip-ploughing lithography method, namely the debris formation during the nanoplough and trench refilling by debris. we are able to reproducibly fabricate nanopatterns down to 40 nm. meanwhile, the afm-tip lifetime has been increased substantially. in particular, the adhesion between the pmma layer on the edge of trenches and the substrate is significantly improved to enable reliable pattern transfer into gaas/algaas heterostructures by wet-chemical etching. functional nanodevices with a lateral feature size of 100 nm to an etching depth of 70 nm are demonstrated using the method. |
| WOS关键词 | CONDUCTING POLYMER-FILMS ; NANOMETER-SCALE ; LITHOGRAPHY ; FABRICATION ; SURFACES ; DEVICES ; NANOSTRUCTURES |
| WOS研究方向 | Engineering ; Science & Technology - Other Topics ; Materials Science ; Physics |
| WOS类目 | Engineering, Electrical & Electronic ; Nanoscience & Nanotechnology ; Materials Science, Multidisciplinary ; Physics, Applied |
| 语种 | 英语 |
| WOS记录号 | WOS:000286933800009 |
| 出版者 | IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC |
| URI标识 | http://www.irgrid.ac.cn/handle/1471x/2428102 |
| 专题 | 半导体研究所 |
| 通讯作者 | Lu, Xiaofeng |
| 作者单位 | 1.Univ Manchester, Sch Elect & Elect Engn, Manchester M13 9PL, Lancs, England 2.Chinese Acad Sci, Inst Semicond, State Key Lab Superlattices & Microstruct, Beijing 100083, Peoples R China |
| 推荐引用方式 GB/T 7714 | Lu, Xiaofeng,Balocco, Claudio,Yang, Fuhua,et al. Highly reproducible nanolithography by dynamic plough of an atomic-force microscope tip and thermal-annealing treatment[J]. Ieee transactions on nanotechnology,2011,10(1):53-58. |
| APA | Lu, Xiaofeng,Balocco, Claudio,Yang, Fuhua,&Song, Aimin M..(2011).Highly reproducible nanolithography by dynamic plough of an atomic-force microscope tip and thermal-annealing treatment.Ieee transactions on nanotechnology,10(1),53-58. |
| MLA | Lu, Xiaofeng,et al."Highly reproducible nanolithography by dynamic plough of an atomic-force microscope tip and thermal-annealing treatment".Ieee transactions on nanotechnology 10.1(2011):53-58. |
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来源：半导体研究所
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