中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Electronic properties investigation of silicon supersaturated with tellurium

文献类型:期刊论文

作者Li, Xinyi; Han, Peide; Gao, Lipeng; Mao, Xue; Hu, Shaoxu
刊名Applied physics a-materials science & processing
出版日期2011-12-01
卷号105期号:4页码:1021-1024
ISSN号0947-8396
DOI10.1007/s00339-011-6537-3
通讯作者Li, xinyi(xyli@semi.ac.cn)
英文摘要Hall measurements as a function of temperature and current-voltage (i-v) measurements have been used to study the electronic properties of silicon supersaturated with tellurium (te). the samples were fabricated by ion implantation, followed by thermal annealing at different temperatures in n(2) and by rapid quenching. the experiment results show that the effects on the resistivity and on the hall effect of samples implanted with high doses of te are almost insensitive to temperature. this is not consistent with those of low dose te implanted samples. the dark i-v characteristics and white light i-v characteristics of the junction between the high dose te implanted layer and the substrate were also investigated. the pn junctions of samples with non equilibrium dopant concentrations exhibit decreased rectification, but increased photon to electron conversion efficiency.
WOS研究方向Materials Science ; Physics
WOS类目Materials Science, Multidisciplinary ; Physics, Applied
语种英语
WOS记录号WOS:000297162000033
出版者SPRINGER
URI标识http://www.irgrid.ac.cn/handle/1471x/2428284
专题半导体研究所
通讯作者Li, Xinyi
作者单位Chinese Acad Sci, State Key Lab Integrated Optoelect, Inst Semicond, Beijing 100083, Peoples R China
推荐引用方式
GB/T 7714
Li, Xinyi,Han, Peide,Gao, Lipeng,et al. Electronic properties investigation of silicon supersaturated with tellurium[J]. Applied physics a-materials science & processing,2011,105(4):1021-1024.
APA Li, Xinyi,Han, Peide,Gao, Lipeng,Mao, Xue,&Hu, Shaoxu.(2011).Electronic properties investigation of silicon supersaturated with tellurium.Applied physics a-materials science & processing,105(4),1021-1024.
MLA Li, Xinyi,et al."Electronic properties investigation of silicon supersaturated with tellurium".Applied physics a-materials science & processing 105.4(2011):1021-1024.

入库方式: iSwitch采集

来源:半导体研究所

浏览0
下载0
收藏0
其他版本

除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。