The effects of substrate temperature on the properties of diphasic nanocrystalline silicon thin films
文献类型：期刊论文
| 作者 | Hao, Huiying1; Xing, Jie1; Li, Weimin1; Zeng, Xiangbo2; Kong, Guanglin2; Liao, Xianbo2 |
| 刊名 | Optoelectronics and advanced materials-rapid communications
 |
| 出版日期 | 2011 |
| 卷号 | 5期号:1-2页码:112-115 |
| 关键词 | Nanocrystalline silicon thin films Structure Photoelectrical properties Stability |
| ISSN号 | 1842-6573 |
| 通讯作者 | Hao, huiying(huiyinghaol@cugb.edu.cn) |
| 英文摘要 | A series of diphasic nanocrystalline silicon thin films was prepared by pecvd technique. the effects of substrate temperature on the properties of the films were investigated. the results show that crystalline volume fraction and grain size in the films increase with increasing t-s. the improved structures lead to higher mobility lifetime product and better stability. while the photosensitivity decreases due to the formation of a conductive percolation channel or the shift of femi-level in the diphasic films. in our case, the diphasic nanocrystalline silicon thin film deposited at 200 degrees c can gain both the fine photoelectrical properties and high stability. |
| WOS关键词 | MICROCRYSTALLINE SILICON ; SOLAR-CELLS ; TRANSITION FILMS ; HYDROGEN |
| WOS研究方向 | Materials Science ; Optics |
| WOS类目 | Materials Science, Multidisciplinary ; Optics |
| 语种 | 英语 |
| WOS记录号 | WOS:000288625000024 |
| 出版者 | NATL INST OPTOELECTRONICS |
| URI标识 | http://www.irgrid.ac.cn/handle/1471x/2428412 |
| 专题 | 半导体研究所 |
| 通讯作者 | Hao, Huiying |
| 作者单位 | 1.China Univ Geosci, Sch Mat Sci & Technol, Beijing 100083, Peoples R China 2.Chinese Acad Sci, Inst Semicond, Key Lab Semicond Mat Sci, Beijing 100083, Peoples R China |
| 推荐引用方式 GB/T 7714 | Hao, Huiying,Xing, Jie,Li, Weimin,et al. The effects of substrate temperature on the properties of diphasic nanocrystalline silicon thin films[J]. Optoelectronics and advanced materials-rapid communications,2011,5(1-2):112-115. |
| APA | Hao, Huiying,Xing, Jie,Li, Weimin,Zeng, Xiangbo,Kong, Guanglin,&Liao, Xianbo.(2011).The effects of substrate temperature on the properties of diphasic nanocrystalline silicon thin films.Optoelectronics and advanced materials-rapid communications,5(1-2),112-115. |
| MLA | Hao, Huiying,et al."The effects of substrate temperature on the properties of diphasic nanocrystalline silicon thin films".Optoelectronics and advanced materials-rapid communications 5.1-2(2011):112-115. |
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来源：半导体研究所
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