中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Temperature performance of the edge emitting transistor laser

文献类型:期刊论文

作者Liang, Song; Zhu, Hongliang; Kong, Duanhua; Niu, Bin; Zhao, Lingjuan; Wang, Wei
刊名Applied physics letters
出版日期2011-07-04
卷号99期号:1页码:3
ISSN号0003-6951
DOI10.1063/1.3608384
通讯作者Liang, song(liangsong@semi.ac.cn)
英文摘要The characteristic temperature (t(0)) of the edge emitting transistor laser (tl) is studied numerically. for the deep-ridge tl, the common base (cb) mode characteristic temperature (t(0,cb)) is a lot lower than the common emitter (ce) mode characteristic temperature (t(0,ce)), which is comparable to a conventional laser. this is resulted from the increase of the emitter to base current gain with the base current, which amplifies the increase of the cb threshold current with temperature. for the shallow-ridge tl, the t(0,ce) is found to be also rather low and is only slightly higher than the t(0,cb). this can be attributed to the large fraction of electron current in the total base current, which is related to the large thickness of base layer and the insertion of quantum wells in the tl. (c) 2011 american institute of physics. [doi: 10.1063/1.3608384]
WOS关键词HETEROSTRUCTURE LASER ; BIPOLAR-TRANSISTOR ; OPERATION ; INTEGRATION
WOS研究方向Physics
WOS类目Physics, Applied
语种英语
WOS记录号WOS:000292639200074
出版者AMER INST PHYSICS
URI标识http://www.irgrid.ac.cn/handle/1471x/2428481
专题半导体研究所
通讯作者Liang, Song
作者单位Chinese Acad Sci, Inst Semicond, Key Lab Semicond Mat, Beijing 100083, Peoples R China
推荐引用方式
GB/T 7714
Liang, Song,Zhu, Hongliang,Kong, Duanhua,et al. Temperature performance of the edge emitting transistor laser[J]. Applied physics letters,2011,99(1):3.
APA Liang, Song,Zhu, Hongliang,Kong, Duanhua,Niu, Bin,Zhao, Lingjuan,&Wang, Wei.(2011).Temperature performance of the edge emitting transistor laser.Applied physics letters,99(1),3.
MLA Liang, Song,et al."Temperature performance of the edge emitting transistor laser".Applied physics letters 99.1(2011):3.

入库方式: iSwitch采集

来源:半导体研究所

浏览0
下载0
收藏0
其他版本

除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。