中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Tem study of dislocations in znte/gaas heterostructure grown by hot-wall epitaxy

文献类型:期刊论文

作者Han, PD
刊名Defect and diffusion forum
出版日期1999
卷号174页码:59-65
关键词Hrem Large-angle stereo-projection Misfit dislocations Stacking faults Tem
ISSN号1012-0386
英文摘要A znte layer grown on gaas substrate by hot-wall epitaxy (hwe) was studied using transmission electron microscopy (tem). for a (110) cross-sectional specimen, its (001) znte/gaas interface was analysed by large angle stereo-projection (lasp) and high resolution electron microscopy (hrem). in the lasp, a double diffraction occurred and moire fringes were formed, meanwhile misfit dislocations were revealled clearly by weak beam technique. in hrem, not only lomer and 60 degrees types of misfit dislocations were observed, but also two types of stacking faults were analysed. the residual strain was estimated by both methods.
WOS关键词ELECTRON-MICROSCOPY ; LAYER ; SUPERLATTICES
WOS研究方向Materials Science ; Physics
WOS类目Materials Science, Multidisciplinary ; Physics, Condensed Matter
语种英语
WOS记录号WOS:000082667600004
出版者TRANS TECH-SCITEC PUBLICATIONS LTD
URI标识http://www.irgrid.ac.cn/handle/1471x/2428729
专题半导体研究所
作者单位Chinese Acad Sci, Inst Semicond, Lab Semicond Mat Sci, Beijing 100083, Peoples R China
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GB/T 7714
Han, PD. Tem study of dislocations in znte/gaas heterostructure grown by hot-wall epitaxy[J]. Defect and diffusion forum,1999,174:59-65.
APA Han, PD.(1999).Tem study of dislocations in znte/gaas heterostructure grown by hot-wall epitaxy.Defect and diffusion forum,174,59-65.
MLA Han, PD."Tem study of dislocations in znte/gaas heterostructure grown by hot-wall epitaxy".Defect and diffusion forum 174(1999):59-65.

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来源:半导体研究所

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