中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Electronic characteristics of inas/gaas self-assembled quantum dots by deep level transient spectroscopy

文献类型:期刊论文

作者Wang, HL; Ning, D; Zhu, HJ; Chen, F; Wang, H; Wang, XD; Feng, SL
刊名Journal of crystal growth
出版日期2000
卷号208期号:1-4页码:107-112
关键词Self-assembled quantum dots Inas/gaas Dlts Pl Activation energy Capture barrier
ISSN号0022-0248
通讯作者Wang, hl()
英文摘要A deep level transient spectroscopy technique has been used to determine the emission activation energies and capture barriers for electrons and holes in inas self-assembled quantum dots embedded in gaas. the ground electron and hole energies relative to their respective energy band edges of gaas are 0.13 and 0.09 ev. measurements show that the capture cross section of quantum dots is thermally activated. the capture barrier of quantum dots for electrons and holes are 0.30 and 0.26 ev, respectively. the results fit well with the results of photoluminescence spectroscopy measurements. (c) 2000 elsevier science b.v. all rights reserved.
WOS关键词ENERGY-LEVELS ; CARRIER RELAXATION ; GROWTH
WOS研究方向Crystallography ; Materials Science ; Physics
WOS类目Crystallography ; Materials Science, Multidisciplinary ; Physics, Applied
语种英语
WOS记录号WOS:000084486400016
出版者ELSEVIER SCIENCE BV
URI标识http://www.irgrid.ac.cn/handle/1471x/2428813
专题半导体研究所
通讯作者Wang, HL
作者单位Chinese Acad Sci, Natl Lab Superlattices & Microstruct, Inst Semicond, Beijing, Peoples R China
推荐引用方式
GB/T 7714
Wang, HL,Ning, D,Zhu, HJ,et al. Electronic characteristics of inas/gaas self-assembled quantum dots by deep level transient spectroscopy[J]. Journal of crystal growth,2000,208(1-4):107-112.
APA Wang, HL.,Ning, D.,Zhu, HJ.,Chen, F.,Wang, H.,...&Feng, SL.(2000).Electronic characteristics of inas/gaas self-assembled quantum dots by deep level transient spectroscopy.Journal of crystal growth,208(1-4),107-112.
MLA Wang, HL,et al."Electronic characteristics of inas/gaas self-assembled quantum dots by deep level transient spectroscopy".Journal of crystal growth 208.1-4(2000):107-112.

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来源:半导体研究所

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