中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
The improvement characteristics of homoepitaxial gaas grown by atomic hydrogen-assisted molecular beam epitaxy

文献类型:期刊论文

作者Wang, HL; Zhu, HJ; Ning, D; Wang, H; Wang, XD; Guo, ZS; Feng, SL
刊名Journal of infrared and millimeter waves
出版日期2000-06-01
卷号19期号:3页码:191-193
关键词Atomic hydrogen-assisted molecular beam epitaxy Deep level transient spectroscopy Deep level defects
ISSN号1001-9014
通讯作者Ning, d()
英文摘要The electrical activity of defects in gaas grown on gaas substrates doped with si and be by both conventional molecular beam epitaxy (mbe) and atomic hydrogen-assisted mbe (h-mbe) were characterized by deep level transient spectroscopy. the trap densities are significantly reduced in the homoepitaxial gaas grown by h-mbe compared to that grown by mbe. the reduction of trap densities is attributed to in situ passivation of these defects by atomic h during the growth. the improvement characteristics of gaas materials will be significance for fabrication of semiconductor devices.
WOS关键词DISLOCATION DENSITY ; IRRADIATION
WOS研究方向Optics
WOS类目Optics
语种英语
WOS记录号WOS:000087691900008
出版者SCIENCE PRESS
URI标识http://www.irgrid.ac.cn/handle/1471x/2428841
专题半导体研究所
通讯作者Ning, D
作者单位Chinese Acad Sci, Inst Semicond, Natl Lab Superlattices & Microstruct, Beijing 100083, Peoples R China
推荐引用方式
GB/T 7714
Wang, HL,Zhu, HJ,Ning, D,et al. The improvement characteristics of homoepitaxial gaas grown by atomic hydrogen-assisted molecular beam epitaxy[J]. Journal of infrared and millimeter waves,2000,19(3):191-193.
APA Wang, HL.,Zhu, HJ.,Ning, D.,Wang, H.,Wang, XD.,...&Feng, SL.(2000).The improvement characteristics of homoepitaxial gaas grown by atomic hydrogen-assisted molecular beam epitaxy.Journal of infrared and millimeter waves,19(3),191-193.
MLA Wang, HL,et al."The improvement characteristics of homoepitaxial gaas grown by atomic hydrogen-assisted molecular beam epitaxy".Journal of infrared and millimeter waves 19.3(2000):191-193.

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来源:半导体研究所

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