中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Effect of rapid thermal annealing on ingaas/gaas quantum wells

文献类型:期刊论文

作者Zhuang, QD; Li, JM; Zeng, YP; Yoon, SF; Zheng, HQ; Kong, MY; Lin, LY
刊名Journal of crystal growth
出版日期2000-04-01
卷号212期号:1-2页码:352-355
关键词Annealing Ingaas/gaas Quantum wells Interdiffusion Quantum dots Mbe
ISSN号0022-0248
通讯作者Zhuang, qd()
英文摘要We have studied the effect of rapid thermal annealing (rta) on highly strained ingaas/gaas quantum wells by using photoluminescence (pl) and double-crystal x-ray diffraction (dcxrd) measurements. it is found that a distinct additional pl emission peak can be observed for the annealed samples. this pl emission possesses features similar to the pl emission from ingaas/gaas quantum dots (qds) with the same indium content. it is proposed that this emission stems from qds, which were formed during the annealing process. this formation is attributed to the favorable diffusion due to the inhomogeneous strain distribution in the ingaas layer intersurface. the dcxrd measurements also confirm that the dominant relaxation is strain enhanced diffusion under the low annealing temperatures. (c) 2000 elsevier science b.v. all rights reserved.
WOS关键词DOT SUPERLATTICE
WOS研究方向Crystallography ; Materials Science ; Physics
WOS类目Crystallography ; Materials Science, Multidisciplinary ; Physics, Applied
语种英语
WOS记录号WOS:000086678100047
出版者ELSEVIER SCIENCE BV
URI标识http://www.irgrid.ac.cn/handle/1471x/2428931
专题半导体研究所
通讯作者Zhuang, QD
作者单位1.Nanyang Technol Univ, Sch Elect & Elect Engn, Microelect Div, Singapore 639798, Singapore
2.Chinese Acad Sci, Inst Semicond, Novel Mat Ctr, Beijing 100083, Peoples R China
推荐引用方式
GB/T 7714
Zhuang, QD,Li, JM,Zeng, YP,et al. Effect of rapid thermal annealing on ingaas/gaas quantum wells[J]. Journal of crystal growth,2000,212(1-2):352-355.
APA Zhuang, QD.,Li, JM.,Zeng, YP.,Yoon, SF.,Zheng, HQ.,...&Lin, LY.(2000).Effect of rapid thermal annealing on ingaas/gaas quantum wells.Journal of crystal growth,212(1-2),352-355.
MLA Zhuang, QD,et al."Effect of rapid thermal annealing on ingaas/gaas quantum wells".Journal of crystal growth 212.1-2(2000):352-355.

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来源:半导体研究所

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