中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Study of self-assembled inas quantum dots grown on low temperature gaas epi-layer

文献类型:期刊论文

作者Wang, XD; Wang, H; Wang, HL; Niu, ZC; Feng, SL
刊名Journal of infrared and millimeter waves
出版日期2000-06-01
卷号19期号:3页码:177-180
关键词Inas quantum dots Low temperature gaas As precipitates
ISSN号1001-9014
通讯作者Wang, xd()
英文摘要Inas self-organized quantum dots (qds) grown on annealed low temperature gaas (lt-gaas) epi-layer were investigated by transmission electron microscopy (tem) and photoluminescence (pl) measurement. tem showed that qds formed on annealed lt-gaas epi-layer have a smaller size and a higher density than qds formed on normal gaas buffer layer. in addition, the pl spectra analysis showed that the lt-gaas epi-layer resulted in a blue shift in peak energy, and a narrower linewidth in the pl peak. the differences were attributed to the point defects and as precipitates in annealed lt-gaas epi-layer for the point defects and as precipitates change the strain field of the surface. the results provide a method to improve the uniformity and change the energy band structure of the qds by controlling the defects in the lt-gaas epi-layer.
WOS关键词MOLECULAR-BEAM EPITAXY ; DEPENDENCE
WOS研究方向Optics
WOS类目Optics
语种英语
WOS记录号WOS:000087691900004
出版者SCIENCE PRESS
URI标识http://www.irgrid.ac.cn/handle/1471x/2428942
专题半导体研究所
通讯作者Wang, XD
作者单位Chinese Acad Sci, Inst Semicond, Natl Lab Superlattices & Microstruct, Beijing 100083, Peoples R China
推荐引用方式
GB/T 7714
Wang, XD,Wang, H,Wang, HL,et al. Study of self-assembled inas quantum dots grown on low temperature gaas epi-layer[J]. Journal of infrared and millimeter waves,2000,19(3):177-180.
APA Wang, XD,Wang, H,Wang, HL,Niu, ZC,&Feng, SL.(2000).Study of self-assembled inas quantum dots grown on low temperature gaas epi-layer.Journal of infrared and millimeter waves,19(3),177-180.
MLA Wang, XD,et al."Study of self-assembled inas quantum dots grown on low temperature gaas epi-layer".Journal of infrared and millimeter waves 19.3(2000):177-180.

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来源:半导体研究所

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