中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Influence of ion energy and deposition temperature on the surface morphology of carbon films deposited by ion beams

文献类型:期刊论文

作者Liao, MY; Qin, FG; Chai, CL; Liu, ZK; Yang, SY; Yao, ZY; Wang, ZG
刊名Acta physica sinica
出版日期2001-07-01
卷号50期号:7页码:1324-1328
关键词Amorphous carbon Surface morphology Mass-selected low energy ion beam deposition
ISSN号1000-3290
通讯作者Liao, my()
英文摘要Carbon films were deposited by mass-selected ion beam technique with ion energies 50-200ev at a substrate temperature from room temperature to 80 degreesc,. for the energies used, smooth diamond-like carbon films were deposited at room temperature. when the substrate temperature was 600 degreesc,rough graphitic films were produced. but highly oriented carbon tubes were observed when the energies were larger than 140ev at 800 degreesc. they were perpendicular to the surface and parallel to each other. preferred orientation of graphite basic plane was observed by high-resolution electron microscopy. shallow ion implantation and stress are responsible for this orientation.
WOS关键词TETRAHEDRAL AMORPHOUS-CARBON ; BIAS-ENHANCED NUCLEATION ; ATOMIC-FORCE MICROSCOPY ; DIAMOND-LIKE CARBON ; SILICON ; GROWTH ; MODEL
WOS研究方向Physics
WOS类目Physics, Multidisciplinary
语种英语
WOS记录号WOS:000169720600025
出版者CHINESE PHYSICAL SOC
URI标识http://www.irgrid.ac.cn/handle/1471x/2429036
专题半导体研究所
通讯作者Liao, MY
作者单位Chinese Acad Sci, Inst Semicond, Lab Semicond Mat Sci, Beijing 100083, Peoples R China
推荐引用方式
GB/T 7714
Liao, MY,Qin, FG,Chai, CL,et al. Influence of ion energy and deposition temperature on the surface morphology of carbon films deposited by ion beams[J]. Acta physica sinica,2001,50(7):1324-1328.
APA Liao, MY.,Qin, FG.,Chai, CL.,Liu, ZK.,Yang, SY.,...&Wang, ZG.(2001).Influence of ion energy and deposition temperature on the surface morphology of carbon films deposited by ion beams.Acta physica sinica,50(7),1324-1328.
MLA Liao, MY,et al."Influence of ion energy and deposition temperature on the surface morphology of carbon films deposited by ion beams".Acta physica sinica 50.7(2001):1324-1328.

入库方式: iSwitch采集

来源:半导体研究所

浏览0
下载0
收藏0
其他版本

除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。