中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Statistical investigation on morphology development of gallium nitride in initial growth stage

文献类型:期刊论文

作者Yuan, HR; Lu, DC; Liu, XL; Chen, Z; Han, P; Wang, XH; Wang, D
刊名Journal of crystal growth
出版日期2002
卷号234期号:1页码:77-84
关键词Atomic force microscopy Crystal morphology Organic vapor phase epitaxy Nitrides
ISSN号0022-0248
通讯作者Lu, dc()
英文摘要Morphology of gallium nitride (gan) in initial growth stage was observed with atomic force microscopy (afm) and scanning electron microscopy (sem), it was found that the epilayer developed from islands to coalesced film. statistics based on afm observation was carried out to investigate the morphology characteristics. it was found that the evolution of height distribution could be used to describe morphology development. statistics also clearly revealed variation of top-face growth rate among islands. indium-doping effect on morphology development was also statistically studied. the roughening and smoothing behavior in morphology development was explained. (c) 2002 elsevier science b.v. all rights reserved.
WOS关键词CHEMICAL-VAPOR-DEPOSITION ; AIN BUFFER LAYER ; GAN ; SAPPHIRE ; ALN ; EPITAXY ; MOVPE
WOS研究方向Crystallography ; Materials Science ; Physics
WOS类目Crystallography ; Materials Science, Multidisciplinary ; Physics, Applied
语种英语
WOS记录号WOS:000172034400010
出版者ELSEVIER SCIENCE BV
URI标识http://www.irgrid.ac.cn/handle/1471x/2429115
专题半导体研究所
通讯作者Lu, DC
作者单位Chinese Acad Sci, Inst Semicond, Lab Semicond Mat & Sci, Beijing 100083, Peoples R China
推荐引用方式
GB/T 7714
Yuan, HR,Lu, DC,Liu, XL,et al. Statistical investigation on morphology development of gallium nitride in initial growth stage[J]. Journal of crystal growth,2002,234(1):77-84.
APA Yuan, HR.,Lu, DC.,Liu, XL.,Chen, Z.,Han, P.,...&Wang, D.(2002).Statistical investigation on morphology development of gallium nitride in initial growth stage.Journal of crystal growth,234(1),77-84.
MLA Yuan, HR,et al."Statistical investigation on morphology development of gallium nitride in initial growth stage".Journal of crystal growth 234.1(2002):77-84.

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来源:半导体研究所

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