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Preparation and structural properties for gan films grown on si (111) by annealing

文献类型:期刊论文

作者Yang, YG; Ma, HL; Xue, CS; Zhuang, HZ; Hao, XT; Ma, J; Teng, SY
刊名Applied surface science
出版日期2002-06-05
卷号193期号:1-4页码:254-260
关键词Gallium nitride films Annealing R.f. magnetron sputtering
ISSN号0169-4332
通讯作者Yang, yg()
英文摘要High quality gan films were prepared by annealing sputtered ga2o3 films under flowing ammonia. ga2o3 films were deposited on si (1 1 1) substrates by r.f. magnetron sputtering. x-ray diffractorneter (xrd) and x-ray photoelectron spectroscopy (xps) measurement results indicate that the polycrystalline gan with hexagonal structure was successfully grown on, the si (1 1 1) substrate. the surface morphology of the gan films was examined by atomic force microscopy (afm) and scanning electron microscopy (sem). varying the annealing temperature and time was found to have great effect on the grain size. (c) 2002 elsevier science b.v. all rights reserved.
WOS关键词MOLECULAR-BEAM EPITAXY ; GALLIUM NITRIDE ; SUBSTRATE
WOS研究方向Chemistry ; Materials Science ; Physics
WOS类目Chemistry, Physical ; Materials Science, Coatings & Films ; Physics, Applied ; Physics, Condensed Matter
语种英语
WOS记录号WOS:000177240300030
出版者ELSEVIER SCIENCE BV
URI标识http://www.irgrid.ac.cn/handle/1471x/2429135
专题半导体研究所
通讯作者Yang, YG
作者单位1.Shandong Univ, Sch Phys & Microelect, Jinan 250100, Peoples R China
2.Shandong Normal Univ, Inst Semicond, Jinan 250014, Peoples R China
3.Shandong Normal Univ, Dept Phys, Jinan 250014, Peoples R China
推荐引用方式
GB/T 7714
Yang, YG,Ma, HL,Xue, CS,et al. Preparation and structural properties for gan films grown on si (111) by annealing[J]. Applied surface science,2002,193(1-4):254-260.
APA Yang, YG.,Ma, HL.,Xue, CS.,Zhuang, HZ.,Hao, XT.,...&Teng, SY.(2002).Preparation and structural properties for gan films grown on si (111) by annealing.Applied surface science,193(1-4),254-260.
MLA Yang, YG,et al."Preparation and structural properties for gan films grown on si (111) by annealing".Applied surface science 193.1-4(2002):254-260.

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来源:半导体研究所

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