TEM and STEM Studies on the Cross-sectional Morphologies of Dual-/Tri-layer Broadband SiO2 Antireflective Films
文献类型：期刊论文
| 作者 | Liu,Wei4; Zu,Xiaotao2; Wang,Shuangyue2; Yan,Hongwei1; Li,Dengji2; Qiao,Liang2; Han,Shaobo3; Yuan,Xiaodong1; Xiang,Xia3 |
| 刊名 | Nanoscale Research Letters
 |
| 出版日期 | 2018-02-12 |
| 卷号 | 13期号:1 |
| 关键词 | Sol–gel process Antireflective film TEM STEM Density ratio |
| ISSN号 | 1931-7573 |
| DOI | 10.1186/s11671-018-2442-4 |
| 通讯作者 | Yan,Hongwei(hwyan@163.com) ; Zu,Xiaotao(xtzu@uestc.edu.cn) |
| 英文摘要 | AbstractDual-layer and tri-layer broadband antireflective (AR) films with excellent transmittance were successfully fabricated using base-/acid-catalyzed mixed sols and propylene oxide (PO) modified silica sols. The sols and films were characterized by scanning electron microscope (SEM), Fourier transform infrared spectroscopy (FTIR), nuclear magnetic resonance (NMR), transmission electron microscope (TEM), and scanning transmission electron microscope (STEM). FTIR and TEM results suggest that the PO molecules were covalently bonded to the silica particles and the bridge structure existing in PO modified silica sol is responsible for the low density of the top layer. The density ratio between different layers was measured by cross-sectional STEM, and the results are 1.69:1 and 2.1:1.7:1 from bottom-layer to top-layer for dual-layer and tri-layer films, respectively. The dual-layer film demonstrates good stability with 99.8% at the central wavelength of 351?nm and nearly 99.5% at the central wavelength of 1053?nm in laser system, and for the tri-layer AR film, the maximum transmittance reached nearly 100% at both the central wavelengths of 527 and 1053?nm. |
| 语种 | 英语 |
| WOS记录号 | BMC:10.1186/S11671-018-2442-4 |
| 出版者 | Springer US |
| 源URL | [http://cas-ir.dicp.ac.cn/handle/321008/167094]  |
| 专题 | 大连化学物理研究所_中国科学院大连化学物理研究所 |
| 通讯作者 | Zu,Xiaotao; Yan,Hongwei |
| 作者单位 | 1. 2. 3. 4. |
| 推荐引用方式 GB/T 7714 | Liu,Wei,Zu,Xiaotao,Wang,Shuangyue,et al. TEM and STEM Studies on the Cross-sectional Morphologies of Dual-/Tri-layer Broadband SiO2 Antireflective Films[J]. Nanoscale Research Letters,2018,13(1). |
| APA | Liu,Wei.,Zu,Xiaotao.,Wang,Shuangyue.,Yan,Hongwei.,Li,Dengji.,...&Xiang,Xia.(2018).TEM and STEM Studies on the Cross-sectional Morphologies of Dual-/Tri-layer Broadband SiO2 Antireflective Films.Nanoscale Research Letters,13(1). |
| MLA | Liu,Wei,et al."TEM and STEM Studies on the Cross-sectional Morphologies of Dual-/Tri-layer Broadband SiO2 Antireflective Films".Nanoscale Research Letters 13.1(2018). |
入库方式： OAI收割
来源：大连化学物理研究所
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