Optimization of inductively coupled plasma etching for low nanometer scale air-hole arrays in two-dimensional GaAs-based photonic crystals
文献类型：期刊论文
| 作者 | Ye Xiaoling ; Xu Bo; Jin Peng; Peng Yinsheng; Ye Xiaoling
|
| 刊名 | journal of semiconductors
 |
| 出版日期 | 2010 |
| 卷号 | 31期号:1页码:012003-1-012003-5 |
| 中文摘要 | this paper mainly describes fabrication of two-dimensional gaas-based photonic crystals with low nanometer scale air-hole arrays using an inductively coupled plasma (icp) etching system. the sidewall profile and surface characteristics of the photonic crystals are systematically investigated as a function of process parameters including icp power, rf power and pressure. various icp powers have no significant effect on the verticality of air-hole sidewall and surface smoothness. in contrast, rf power and chamber pressure play a remarkable role in improving sidewall verticality and surface characteristics of photonic crystals indicating different etching mechanisms for low nanometer scale photonic crystals. the desired photonic crystals have been achieved with hole diameters as low as 130 nm with smooth and vertical profiles by developing a suitable icp processes. the influence of the icp parameters on this device system are analyzed mainly by scanning electron microscopy. this fabrication approach is not limited to gaas material, and may be efficiently applied to the development of most two-dimensional photonic crystal slabs. |
| 学科主题 | 半导体材料 |
| 收录类别 | CSCD |
| 资助信息 | the national natural science foundation of china,the state key development program for basic research of china |
| 语种 | 英语 |
| 公开日期 | 2011-08-16 |
| 源URL | [http://ir.semi.ac.cn/handle/172111/21620]  |
| 专题 | 半导体研究所_中科院半导体材料科学重点实验室 |
| 推荐引用方式 GB/T 7714 | Ye Xiaoling,Xu Bo,Jin Peng,et al. Optimization of inductively coupled plasma etching for low nanometer scale air-hole arrays in two-dimensional GaAs-based photonic crystals[J]. journal of semiconductors,2010,31(1):012003-1-012003-5. |
| APA | Ye Xiaoling,Xu Bo,Jin Peng,Peng Yinsheng,&Ye Xiaoling.(2010).Optimization of inductively coupled plasma etching for low nanometer scale air-hole arrays in two-dimensional GaAs-based photonic crystals.journal of semiconductors,31(1),012003-1-012003-5. |
| MLA | Ye Xiaoling,et al."Optimization of inductively coupled plasma etching for low nanometer scale air-hole arrays in two-dimensional GaAs-based photonic crystals".journal of semiconductors 31.1(2010):012003-1-012003-5. |
入库方式： OAI收割
来源：半导体研究所
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