Multi-scale structure patterning by digital-mask projective lithography with an alterable projective scaling system
文献类型：期刊论文
| 作者 | Liu, Yu-Huan1,2; Zhao, Yuan-Yuan3; Dong, X.-Z.1; Zheng, Mei-Ling1; Jin, Feng1; Liu, Jie1; Duan, Xuan-Ming3; Zhao, Zhen-Sheng1 |
| 刊名 | AIP Advances
 |
| 出版日期 | 2018 |
| 卷号 | 8期号:6 |
| DOI | 10.1063/1.5030585 |
| 英文摘要 | We report a flexible and efficient method to pattern two-dimensional (2D) multi-scale structures by digital-mask projective lithography (DMPL) with an alterable projective scaling system. In the developed DMPL system, femtosecond laser was modulated by digital micromirror device (DMD) to generate a designable intensity distribution with digital image information. The projective law of this DMPL system based on the geometric optics theory verified for different projective scaling lens systematically has been studied. With the combination of the customizable DMD elements and alterable projective scaling system, 2D designable patterned microstructures with multi-scale size range from millimeter to hundred nanometer have been achieved by a single exposure. In addition, an engineered Fresnel zone plate (FZP) with numerical aperture (NA) of 0.36 and focal length of 114 μm has been achieved by a single exposure of 1.2 s. The acquisition of the array of FZP lens shows the stability and efficiency of the pattern process. The proposed method could be expected to play an important role in the flexible and efficient fabrication of engineered 2D multi-scale structures. © 2018 Author(s). |
| 电子版国际标准刊号 | 21583226 |
| 语种 | 英语 |
| 源URL | [http://119.78.100.138/handle/2HOD01W0/8061]  |
| 专题 | 机器人与3D打印技术创新中心 |
| 作者单位 | 1.Laboratory of Organic NanoPhotonics, CAS Key Laboratory of Bio-Inspired Materials and Interfacial Science, Technical Institute of Physics and Chemistry, Chinese Academy of Sciences, No. 29 Zhongguancun East Road, Beijing; 100190, China; 2.School of Future Technologies, University of Chinese Academy of Sciences, Yanqihu Campus, Huaibei Town, Huaibei Zhang, Huairou District, Beijing; 101407, China; 3.Chongqing Key Laboratory of Additive Manufacturing Technology and Systems, Chongqing Institute of Green and Intelligent Technology, Chinese Academy of Sciences, No. 266 Fangzheng Ave, Shuitu Hi-tech Industrial Park, Beibei District, Chongqing; 400714, China |
| 推荐引用方式 GB/T 7714 | Liu, Yu-Huan,Zhao, Yuan-Yuan,Dong, X.-Z.,et al. Multi-scale structure patterning by digital-mask projective lithography with an alterable projective scaling system[J]. AIP Advances,2018,8(6). |
| APA | Liu, Yu-Huan.,Zhao, Yuan-Yuan.,Dong, X.-Z..,Zheng, Mei-Ling.,Jin, Feng.,...&Zhao, Zhen-Sheng.(2018).Multi-scale structure patterning by digital-mask projective lithography with an alterable projective scaling system.AIP Advances,8(6). |
| MLA | Liu, Yu-Huan,et al."Multi-scale structure patterning by digital-mask projective lithography with an alterable projective scaling system".AIP Advances 8.6(2018). |
入库方式： OAI收割
来源：重庆绿色智能技术研究院
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