中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
The property optimization of n-GaN films grown on n-SiC substrates by incorporating a SiNx interlayer

文献类型:期刊论文

作者Shuang Cui; Yuantao Zhang; Zhen Huang; Gaoqiang Deng; Baozhu Li; Degang Zhao; Yuchun Chang
刊名J Mater Sci: Mater Electron
出版日期2017
卷号28页码:6008–6014
学科主题光电子学
公开日期2018-11-30
源URL[http://ir.semi.ac.cn/handle/172111/28790]  
专题半导体研究所_光电子研究发展中心
推荐引用方式
GB/T 7714
Shuang Cui,Yuantao Zhang,Zhen Huang,et al. The property optimization of n-GaN films grown on n-SiC substrates by incorporating a SiNx interlayer[J]. J Mater Sci: Mater Electron,2017,28:6008–6014.
APA Shuang Cui.,Yuantao Zhang.,Zhen Huang.,Gaoqiang Deng.,Baozhu Li.,...&Yuchun Chang.(2017).The property optimization of n-GaN films grown on n-SiC substrates by incorporating a SiNx interlayer.J Mater Sci: Mater Electron,28,6008–6014.
MLA Shuang Cui,et al."The property optimization of n-GaN films grown on n-SiC substrates by incorporating a SiNx interlayer".J Mater Sci: Mater Electron 28(2017):6008–6014.

入库方式: OAI收割

来源:半导体研究所

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