中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Fractal Etching of Graphene

文献类型:期刊论文

作者Geng, Dechao; Wu, Bin; Guo, Yunlong; Luo, Birong; Xue, Yunzhou; Chen, Jianyi; Yu, Gui; Liu, Yunqi
刊名JOURNAL OF THE AMERICAN CHEMICAL SOCIETY
出版日期2013-05-01
卷号135期号:17页码:6431-6434
ISSN号0002-7863
DOI10.1021/ja402224h
英文摘要An anisotropic etching mode is commonly known for perfect crystalline materials, generally leading to simple Euclidean geometric patterns This principle has also proved to apply to the etching of the thinnest crystalline material, graphene, resulting in hexagonal holes with zigzag edge structures. Here we demonstrate for the first time that the graphene etching mode can deviate; significantly from simple anisotropic etching. Using an as-grown graphene film on a liquid copper surface as a model system, we show that the etched graphene pattern can be modulated from a simple hexagonal pattern to complex fractal geometric patterns with sixfold symmetry by varying the Ar/H-2 flow rate ratio: The etched fractal patterns are formed by the repeated construction of a basic identical motif, and the physical origin of the pattern formation is consistent with a diffusion-controlled process. The fractal etching mode of graphene presents an intriguing case for the fundamental study of material etching.
语种英语
WOS记录号WOS:000318469100014
出版者AMER CHEMICAL SOC
源URL[http://ir.iccas.ac.cn/handle/121111/42196]  
专题中国科学院化学研究所
通讯作者Yu, Gui
作者单位Chinese Acad Sci, Inst Chem, Beijing Natl Lab Mol Sci, Beijing 100190, Peoples R China
推荐引用方式
GB/T 7714
Geng, Dechao,Wu, Bin,Guo, Yunlong,et al. Fractal Etching of Graphene[J]. JOURNAL OF THE AMERICAN CHEMICAL SOCIETY,2013,135(17):6431-6434.
APA Geng, Dechao.,Wu, Bin.,Guo, Yunlong.,Luo, Birong.,Xue, Yunzhou.,...&Liu, Yunqi.(2013).Fractal Etching of Graphene.JOURNAL OF THE AMERICAN CHEMICAL SOCIETY,135(17),6431-6434.
MLA Geng, Dechao,et al."Fractal Etching of Graphene".JOURNAL OF THE AMERICAN CHEMICAL SOCIETY 135.17(2013):6431-6434.

入库方式: OAI收割

来源:化学研究所

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