Aligned silicon nanowires with fine-tunable tilting angles by metal-assisted chemical etching on off-cut wafers
文献类型:期刊论文
作者 | Ma, Jie; Wen, Liping; Dong, Zhichao; Zhang, Tong; Wang, Shutao; Jiang, Lei |
刊名 | PHYSICA STATUS SOLIDI-RAPID RESEARCH LETTERS
![]() |
出版日期 | 2013-09-01 |
卷号 | 7期号:9页码:655-658 |
关键词 | Silicon Nanowires Chemical Etching Nanostructures |
ISSN号 | 1862-6254 |
DOI | 10.1002/pssr.201307190 |
英文摘要 | The morphology control of aligned silicon nanowires (SiNWs) is highly desirable as SiNWs demonstrated high prospect in a variety of applications. Besides the control over length, shape and distribution of aligned SiNWs, the fine-tuning of tilting angles thereof also attracted intense interest. Up to now, only several discrete tilting angles have been reported. In this Letter, the ability to fine-tune the tilting angle of SiNWs is demonstrated and the range that can be achieved is identified. Our technique employs the anisotropic characteristic of the etching process using custom-produced off-cut Si wafers of various orientations as substrates. With this technique, a uniquely favoured etching direction can result and the tilting angle can be precisely controlled. Tilted SiNWs with tilting angles from 0 degrees to 50 degrees relative to the wafer normal were obtained. The mechanism of the tilting angle manipulation is also discussed. (c) 2013 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim |
语种 | 英语 |
WOS记录号 | WOS:000327822100013 |
出版者 | WILEY-V C H VERLAG GMBH |
源URL | [http://ir.iccas.ac.cn/handle/121111/42211] ![]() |
专题 | 中国科学院化学研究所 |
通讯作者 | Jiang, Lei |
作者单位 | Chinese Acad Sci, Inst Chem, Key Lab Organ Solids, BNLMS, Beijing 100190, Peoples R China |
推荐引用方式 GB/T 7714 | Ma, Jie,Wen, Liping,Dong, Zhichao,et al. Aligned silicon nanowires with fine-tunable tilting angles by metal-assisted chemical etching on off-cut wafers[J]. PHYSICA STATUS SOLIDI-RAPID RESEARCH LETTERS,2013,7(9):655-658. |
APA | Ma, Jie,Wen, Liping,Dong, Zhichao,Zhang, Tong,Wang, Shutao,&Jiang, Lei.(2013).Aligned silicon nanowires with fine-tunable tilting angles by metal-assisted chemical etching on off-cut wafers.PHYSICA STATUS SOLIDI-RAPID RESEARCH LETTERS,7(9),655-658. |
MLA | Ma, Jie,et al."Aligned silicon nanowires with fine-tunable tilting angles by metal-assisted chemical etching on off-cut wafers".PHYSICA STATUS SOLIDI-RAPID RESEARCH LETTERS 7.9(2013):655-658. |
入库方式: OAI收割
来源:化学研究所
浏览0
下载0
收藏0
其他版本
除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。