中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Aligned silicon nanowires with fine-tunable tilting angles by metal-assisted chemical etching on off-cut wafers

文献类型:期刊论文

作者Ma, Jie; Wen, Liping; Dong, Zhichao; Zhang, Tong; Wang, Shutao; Jiang, Lei
刊名PHYSICA STATUS SOLIDI-RAPID RESEARCH LETTERS
出版日期2013-09-01
卷号7期号:9页码:655-658
关键词Silicon Nanowires Chemical Etching Nanostructures
ISSN号1862-6254
DOI10.1002/pssr.201307190
英文摘要The morphology control of aligned silicon nanowires (SiNWs) is highly desirable as SiNWs demonstrated high prospect in a variety of applications. Besides the control over length, shape and distribution of aligned SiNWs, the fine-tuning of tilting angles thereof also attracted intense interest. Up to now, only several discrete tilting angles have been reported. In this Letter, the ability to fine-tune the tilting angle of SiNWs is demonstrated and the range that can be achieved is identified. Our technique employs the anisotropic characteristic of the etching process using custom-produced off-cut Si wafers of various orientations as substrates. With this technique, a uniquely favoured etching direction can result and the tilting angle can be precisely controlled. Tilted SiNWs with tilting angles from 0 degrees to 50 degrees relative to the wafer normal were obtained. The mechanism of the tilting angle manipulation is also discussed. (c) 2013 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
语种英语
WOS记录号WOS:000327822100013
出版者WILEY-V C H VERLAG GMBH
源URL[http://ir.iccas.ac.cn/handle/121111/42211]  
专题中国科学院化学研究所
通讯作者Jiang, Lei
作者单位Chinese Acad Sci, Inst Chem, Key Lab Organ Solids, BNLMS, Beijing 100190, Peoples R China
推荐引用方式
GB/T 7714
Ma, Jie,Wen, Liping,Dong, Zhichao,et al. Aligned silicon nanowires with fine-tunable tilting angles by metal-assisted chemical etching on off-cut wafers[J]. PHYSICA STATUS SOLIDI-RAPID RESEARCH LETTERS,2013,7(9):655-658.
APA Ma, Jie,Wen, Liping,Dong, Zhichao,Zhang, Tong,Wang, Shutao,&Jiang, Lei.(2013).Aligned silicon nanowires with fine-tunable tilting angles by metal-assisted chemical etching on off-cut wafers.PHYSICA STATUS SOLIDI-RAPID RESEARCH LETTERS,7(9),655-658.
MLA Ma, Jie,et al."Aligned silicon nanowires with fine-tunable tilting angles by metal-assisted chemical etching on off-cut wafers".PHYSICA STATUS SOLIDI-RAPID RESEARCH LETTERS 7.9(2013):655-658.

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来源:化学研究所

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