Molecular Glass Photoresists with High Resolution, Low LER, and High Sensitivity for EUV Lithography
文献类型：期刊论文
| 作者 | Peng, Xiaoman1; Wang, Yafei1; Xu, Jian1; Yuan, Hua1; Wang, Liangqian1; Zhang, Tao1; Guo, Xudong1; Wang, Shuangqing1; Li, Yi2; Yang, Guoqiang1 |
| 刊名 | MACROMOLECULAR MATERIALS AND ENGINEERING
 |
| 出版日期 | 2018-06-01 |
| 卷号 | 303期号:6 |
| 关键词 | Euv Lithography Molecular Glasses Photoresists |
| ISSN号 | 1438-7492 |
| DOI | 10.1002/mame.201700654 |
| 英文摘要 | Novel molecular glasses (MGs) containing bisphenol A backbone (BPA-6 and BPA-10) are synthesized and characterized. BPA-6 and BAP-10 are excellent amorphous materials for extreme ultraviolet (EUV) patterning applications with good thermal stability (T-d more than 160 degrees C). The MGs can be used as positive-tone photoresists combined with triphenylsulfonium perfluoro-1-butanesulfonate and trioctylamine dissolved in propylene glycol monomethyl ether acetate. High-resolution feature sizes as small as 23.1 nm with extremely low line edge roughness (less than 2 nm), high sensitivity (less than 20 mJ cm(-2)), and good high aspect ratio patterns are obtained by using EUV lithography. |
| 语种 | 英语 |
| WOS记录号 | WOS:000435279800006 |
| 出版者 | WILEY-V C H VERLAG GMBH |
| 源URL | [http://ir.iccas.ac.cn/handle/121111/42625]  |
| 专题 | 中国科学院化学研究所 |
| 通讯作者 | Wang, Shuangqing; Li, Yi; Yang, Guoqiang |
| 作者单位 | 1.Univ Chinese Acad Sci, Chinese Acad Sci, Inst Chem, Beijing Natl Lab Mol Sci,Key Lab Photochem, Beijing 100190, Peoples R China 2.Univ Chinese Acad Sci, Chinese Acad Sci, Tech Inst Phys & Chem, Key Lab Photochem Convers & Optoelect Mat, Beijing 100190, Peoples R China |
| 推荐引用方式 GB/T 7714 | Peng, Xiaoman,Wang, Yafei,Xu, Jian,et al. Molecular Glass Photoresists with High Resolution, Low LER, and High Sensitivity for EUV Lithography[J]. MACROMOLECULAR MATERIALS AND ENGINEERING,2018,303(6). |
| APA | Peng, Xiaoman.,Wang, Yafei.,Xu, Jian.,Yuan, Hua.,Wang, Liangqian.,...&Yang, Guoqiang.(2018).Molecular Glass Photoresists with High Resolution, Low LER, and High Sensitivity for EUV Lithography.MACROMOLECULAR MATERIALS AND ENGINEERING,303(6). |
| MLA | Peng, Xiaoman,et al."Molecular Glass Photoresists with High Resolution, Low LER, and High Sensitivity for EUV Lithography".MACROMOLECULAR MATERIALS AND ENGINEERING 303.6(2018). |
入库方式： OAI收割
来源：化学研究所
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