"Double Exposure Method": a Novel Photolithographic Process to Fabricate Flexible Organic Field-Effect Transistors and Circuits
文献类型：期刊论文
| 作者 | Ji, Deyang; Jiang, Lang; Dong, Huanli; Meng, Qing; Wang, Zongrui; Zhang, Hantang; Hu, Wenping |
| 刊名 | ACS APPLIED MATERIALS & INTERFACES
 |
| 出版日期 | 2013-04-10 |
| 卷号 | 5期号:7页码:2316-2319 |
| 关键词 | Double Exposure Polystyrene Flexible Ofets Organic Circuits |
| ISSN号 | 1944-8244 |
| DOI | 10.1021/am302684k |
| 英文摘要 | A novel process called "double exposure method" has for the first time been developed to utilize common organic materials as insulating layers at low annealing temperature in the process of photolithography. In this method, organic dielectric layer will not dissolve in the final lift-off step by using developer to replace traditional acetone. Bottom-gate bottom-contact (BGBC) OFETs are fabricated on the flexible PET substrates with polystyrene (PS) and pentacene as dielectric layer and semiconductor layer, respectively. Transistors with mobility of 0.36 cm(2) V-1 s(-1) and logic inverter with gain of 9 on the plastic substrates have been fabricated, demonstrating the potential appliction of "double exposure method" in flexible organic electronics. |
| 语种 | 英语 |
| WOS记录号 | WOS:000317549100003 |
| 出版者 | AMER CHEMICAL SOC |
| 源URL | [http://ir.iccas.ac.cn/handle/121111/47087]  |
| 专题 | 中国科学院化学研究所 |
| 通讯作者 | Jiang, Lang |
| 作者单位 | Chinese Acad Sci, Beijing Natl Lab Mol Sci, Inst Chem, Key Lab Organ Solids, Beijing 100190, Peoples R China |
| 推荐引用方式 GB/T 7714 | Ji, Deyang,Jiang, Lang,Dong, Huanli,et al. "Double Exposure Method": a Novel Photolithographic Process to Fabricate Flexible Organic Field-Effect Transistors and Circuits[J]. ACS APPLIED MATERIALS & INTERFACES,2013,5(7):2316-2319. |
| APA | Ji, Deyang.,Jiang, Lang.,Dong, Huanli.,Meng, Qing.,Wang, Zongrui.,...&Hu, Wenping.(2013)."Double Exposure Method": a Novel Photolithographic Process to Fabricate Flexible Organic Field-Effect Transistors and Circuits.ACS APPLIED MATERIALS & INTERFACES,5(7),2316-2319. |
| MLA | Ji, Deyang,et al.""Double Exposure Method": a Novel Photolithographic Process to Fabricate Flexible Organic Field-Effect Transistors and Circuits".ACS APPLIED MATERIALS & INTERFACES 5.7(2013):2316-2319. |
入库方式： OAI收割
来源：化学研究所
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