Fabrication of antireflective layers on silicon using metal-assisted chemical etching with in situ deposition of silver nanoparticle catalysts
文献类型：期刊论文
| 作者 | Geng, Xuewen1,2; Qi, Zhe3; Li, Meicheng4; Duan, Barrett K.5; Zhao, Liancheng1; Bohn, Paul W.2,5 |
| 刊名 | SOLAR ENERGY MATERIALS AND SOLAR CELLS
 |
| 出版日期 | 2012-08-01 |
| 卷号 | 103页码:98-107 |
| 关键词 | Metal-assisted Chemical Etching Antireflection Porous Silicon |
| ISSN号 | 0927-0248 |
| DOI | 10.1016/j.solmat.2012.04.020 |
| 英文摘要 | Ag particle-assisted chemical etching of silicon wafers in HF/H2O2 is of interest for its potential to produce antireflective layers for solar cells. In this work, Ag films containing both nanoscale (d < 100 nm) and microscale (d < 1 mu m) particles were deposited through the silver-mirror reaction on planar p-Si(111), planar p-Si(100) and p-Si(100) pre-etched in KOH/isopropanol to produce pyramidal textures. Subsequently, these wafers were subjected to metal-assisted chemical etching (MacEtch) in 1:1:1 (v:v:v) HF(49%):H2O2(30%):EtOH solutions, to produce porous silicon (PSi) containing both micro- and nanoscale roughness features. The resulting surfaces exhibit morphologies that evolve with processing conditions, especially the absence/presence of pyramidal textures and the time the structure is subjected to MacEtch. Under optimal conditions excellent anti-reflection behavior is observed with surface reflectivities being reduced below 10% for either p-Si(100) or p-Si(111) surfaces. For p-Si(100) better results (R similar to 5%) were obtained for 30 min KOH/isopropanol pre-etch than for either no pre-etch or longer (60 min) pre-etch. The influence of the reductant on Ag particle deposition on p-Si(111) was studied, and MacEtch catalyzed by Ag produced from acetaldehyde reductant produced surfaces with lower reflectivities than those with glucose reductant. (C) 2012 Elsevier B.V. All rights reserved. |
| 语种 | 英语 |
| WOS记录号 | WOS:000306044300016 |
| 出版者 | ELSEVIER SCIENCE BV |
| 源URL | [http://ir.iccas.ac.cn/handle/121111/47289]  |
| 专题 | 中国科学院化学研究所 |
| 通讯作者 | Geng, Xuewen |
| 作者单位 | 1.Harbin Inst Technol, Sch Mat Sci & Engn, Harbin 150001, Heilongjiang, Peoples R China 2.Univ Notre Dame, Dept Chem & Biomol Engn, Notre Dame, IN 46556 USA 3.Chinese Acad Sci, Inst Chem, Beijing 100190, Peoples R China 4.N China Elect Power Univ, Renewable Energy Sch, Beijing 102206, Peoples R China 5.Univ Notre Dame, Dept Chem & Biochem, Notre Dame, IN 46556 USA |
| 推荐引用方式 GB/T 7714 | Geng, Xuewen,Qi, Zhe,Li, Meicheng,et al. Fabrication of antireflective layers on silicon using metal-assisted chemical etching with in situ deposition of silver nanoparticle catalysts[J]. SOLAR ENERGY MATERIALS AND SOLAR CELLS,2012,103:98-107. |
| APA | Geng, Xuewen,Qi, Zhe,Li, Meicheng,Duan, Barrett K.,Zhao, Liancheng,&Bohn, Paul W..(2012).Fabrication of antireflective layers on silicon using metal-assisted chemical etching with in situ deposition of silver nanoparticle catalysts.SOLAR ENERGY MATERIALS AND SOLAR CELLS,103,98-107. |
| MLA | Geng, Xuewen,et al."Fabrication of antireflective layers on silicon using metal-assisted chemical etching with in situ deposition of silver nanoparticle catalysts".SOLAR ENERGY MATERIALS AND SOLAR CELLS 103(2012):98-107. |
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来源：化学研究所
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