In situ time-resolved DXAFS study of Rh nanoparticle formation mechanism in ethylene glycol at elevated temperature
文献类型:期刊论文
作者 | Asakura, Hiroyuki1; Teramura, Kentaro1; Shishido, Tetsuya1; Tanaka, Tsunehiro1; Yan, Ning2; Xiao, Chaoxian3; Yao, Siyu3; Kou, Yuan3 |
刊名 | PHYSICAL CHEMISTRY CHEMICAL PHYSICS
![]() |
出版日期 | 2012 |
卷号 | 14期号:9页码:2983-2990 |
ISSN号 | 1463-9076 |
DOI | 10.1039/c2cp23070d |
英文摘要 | A combination of in situ time-resolved DXAFS and ICP-MS techniques reveals that the formation process of Rh nanoparticles (NPs) from rhodium trichloride trihydrate (RhCl3 center dot 3H(2)O) in ethylene glycol with polyvinylpyrrolidone (PVP) at elevated temperature is a first-order reaction, which indicates that uniform size Rh NPs appear consecutively and these Rh NPs do not aggregate with each other. |
语种 | 英语 |
WOS记录号 | WOS:000300046800003 |
出版者 | ROYAL SOC CHEMISTRY |
源URL | [http://ir.iccas.ac.cn/handle/121111/47735] ![]() |
专题 | 中国科学院化学研究所 |
通讯作者 | Tanaka, Tsunehiro |
作者单位 | 1.Kyotodaigaku Katsura, Kyoto, Japan 2.Ecole Polytech Fed Lausanne, Inst Sci & Ingn Chim, CH-1015 Lausanne, Switzerland 3.Peking Univ, PKU Green Chem Ctr, Beijing Natl Lab Mol Sci, Coll Chem & Mol Engn, Beijing 100871, Peoples R China |
推荐引用方式 GB/T 7714 | Asakura, Hiroyuki,Teramura, Kentaro,Shishido, Tetsuya,et al. In situ time-resolved DXAFS study of Rh nanoparticle formation mechanism in ethylene glycol at elevated temperature[J]. PHYSICAL CHEMISTRY CHEMICAL PHYSICS,2012,14(9):2983-2990. |
APA | Asakura, Hiroyuki.,Teramura, Kentaro.,Shishido, Tetsuya.,Tanaka, Tsunehiro.,Yan, Ning.,...&Kou, Yuan.(2012).In situ time-resolved DXAFS study of Rh nanoparticle formation mechanism in ethylene glycol at elevated temperature.PHYSICAL CHEMISTRY CHEMICAL PHYSICS,14(9),2983-2990. |
MLA | Asakura, Hiroyuki,et al."In situ time-resolved DXAFS study of Rh nanoparticle formation mechanism in ethylene glycol at elevated temperature".PHYSICAL CHEMISTRY CHEMICAL PHYSICS 14.9(2012):2983-2990. |
入库方式: OAI收割
来源:化学研究所
浏览0
下载0
收藏0
其他版本
除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。