中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Low temperature growth of nanoblade In2O3 thin films by plasma enhanced chemical vapor deposition: Morphology control and lithium storage properties

文献类型:期刊论文

作者Zheng, Jie; Yang, Rong; Lou, Yu; Li, Wei; Li, Xingguo
刊名THIN SOLID FILMS
出版日期2012-10-30
卷号521页码:137-140
关键词Plasma Enhanced Chemical Vapor Deposition Indium Oxide Nanoblades Electrode Lithium Storage
ISSN号0040-6090
DOI10.1016/j.tsf.2012.02.018
英文摘要In2O3 thin films with vertically aligned blade like structure are prepared at low temperature of 300 degrees C by plasma enhanced chemical vapor deposition using InCl3, O-2 and H-2 as the precursors. The nanoscale morphology can be controlled by the H-2 flow in the reaction system. Vertically aligned nanoblades with smooth surface can be obtained by directly reacting InCl3 with O-2. Increasing the H-2 fraction in the reaction system will causes secondary growth on the blade surface and finally leads to destruction of the blade like structure. Optical emission spectroscopy suggests that the morphology evolution induced by H-2 addition can be attributed to the enhanced InCl3 dissociation and the suppressed etching effect of atomic Cl. The nanoblade In2O3 thin films exhibit superior lithium storage properties with a high stable capacity of 580 mAh.g(-1) up to 100 cycles, which is attributed to the well separated thin blade like nanostructure. (C) 2012 Elsevier B.V. All rights reserved.
语种英语
WOS记录号WOS:000309905900032
出版者ELSEVIER SCIENCE SA
源URL[http://ir.iccas.ac.cn/handle/121111/49703]  
专题中国科学院化学研究所
通讯作者Li, Xingguo
作者单位Peking Univ, Coll Chem & Mol Engn, State Key Lab Rare Earth Mat Chem & Applicat, BNLMS, Beijing 100871, Peoples R China
推荐引用方式
GB/T 7714
Zheng, Jie,Yang, Rong,Lou, Yu,et al. Low temperature growth of nanoblade In2O3 thin films by plasma enhanced chemical vapor deposition: Morphology control and lithium storage properties[J]. THIN SOLID FILMS,2012,521:137-140.
APA Zheng, Jie,Yang, Rong,Lou, Yu,Li, Wei,&Li, Xingguo.(2012).Low temperature growth of nanoblade In2O3 thin films by plasma enhanced chemical vapor deposition: Morphology control and lithium storage properties.THIN SOLID FILMS,521,137-140.
MLA Zheng, Jie,et al."Low temperature growth of nanoblade In2O3 thin films by plasma enhanced chemical vapor deposition: Morphology control and lithium storage properties".THIN SOLID FILMS 521(2012):137-140.

入库方式: OAI收割

来源:化学研究所

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