Controllable Self Assembly of Colloidal Crystal Arrays on SU-8 Photoresist Micropatterns
文献类型：期刊论文
| 作者 | Yang, Shu-Jing1; Yu, Bing1,2; Cong, Hai-Lin1,2; Zhang, Mei-Rong1; Chi, Xiao-Fang1; Ma, Yu-Rong3,4; Wang, Ji-Lei1; Bai, Xue1; Wang, Shao-Peng1 |
| 刊名 | INTEGRATED FERROELECTRICS
 |
| 出版日期 | 2013 |
| 卷号 | 144期号:1页码:79-83 |
| 关键词 | Colloidal Crystal Self Assembly Micropattern Su-8 Photoresist |
| ISSN号 | 1058-4587 |
| DOI | 10.1080/10584587.2013.787342 |
| 英文摘要 | In this paper, we report on the effect of micropatterned SU-8 photoresist surfaces to self assembly of ordered colloidal crystal arrays. SU-8 microstructures are photopatterned onto glass substrates with minimal feature resolution of 1.5m using ultraviolet (UV) exposure. By simply controlling the colloidal concentration of the self assembly solution and the dimensions of the micropatterns, ordered colloidal crystal arrays are formed inside the SU-8 micropatterns. The method may have potential applications in photonic crystal device and chip fabrications. |
| 语种 | 英语 |
| WOS记录号 | WOS:000321544200011 |
| 出版者 | TAYLOR & FRANCIS LTD |
| 源URL | [http://ir.iccas.ac.cn/handle/121111/54811]  |
| 专题 | 中国科学院化学研究所 |
| 通讯作者 | Yu, Bing |
| 作者单位 | 1.Qingdao Univ, Coll Chem & Environm Engn, Qingdao 266071, Peoples R China 2.Qingdao Univ, Growing Base State Key Lab, Lab New Fiber Mat & Modern Text, Qingdao 266071, Peoples R China 3.Peking Univ, Coll Chem & Mol Engn, Beijing 100871, Peoples R China 4.BNLMS, Beijing 100871, Peoples R China |
| 推荐引用方式 GB/T 7714 | Yang, Shu-Jing,Yu, Bing,Cong, Hai-Lin,et al. Controllable Self Assembly of Colloidal Crystal Arrays on SU-8 Photoresist Micropatterns[J]. INTEGRATED FERROELECTRICS,2013,144(1):79-83. |
| APA | Yang, Shu-Jing.,Yu, Bing.,Cong, Hai-Lin.,Zhang, Mei-Rong.,Chi, Xiao-Fang.,...&Wang, Shao-Peng.(2013).Controllable Self Assembly of Colloidal Crystal Arrays on SU-8 Photoresist Micropatterns.INTEGRATED FERROELECTRICS,144(1),79-83. |
| MLA | Yang, Shu-Jing,et al."Controllable Self Assembly of Colloidal Crystal Arrays on SU-8 Photoresist Micropatterns".INTEGRATED FERROELECTRICS 144.1(2013):79-83. |
入库方式： OAI收割
来源：化学研究所
浏览0
下载0
收藏0
其他版本
除非特别说明，本系统中所有内容都受版权保护，并保留所有权利。