Direct patterning of polymer-based photo luminescent structures with a mask
文献类型:期刊论文
作者 | Peng, J; Han, YC; Yang, YM; Li, BY |
刊名 | THIN SOLID FILMS
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出版日期 | 2004-03-01 |
卷号 | 450期号:2页码:329-333 |
关键词 | Atomic Force Microscopy Optical Properties Patterning Thin Polymer Film |
ISSN号 | 0040-6090 |
DOI | 10.1016/j.tsf.2003.09.042 |
英文摘要 | We report a simple method to directly pattern polymer-based photo luminescent material, i.e. a prepatterned mask is placed a close distance above it. The final structure is a positive replica of the lateral structures in the mask with submicrometer resolution. The comparison of luminescence efficiency before and after patterning indicates almost no degradation in optical property of the material during the experiments. The mechanism of pattern formation is also discussed. (C) 2003 Elsevier B.V. All rights reserved. |
语种 | 英语 |
WOS记录号 | WOS:000220442100017 |
出版者 | ELSEVIER SCIENCE SA |
源URL | [http://ir.iccas.ac.cn/handle/121111/55771] ![]() |
专题 | 中国科学院化学研究所 |
通讯作者 | Han, YC |
作者单位 | Chinese Acad Sci, Changchun Inst Appl Chem, State Key Lab Polymer Phys & Chem, Changchun 130022, Peoples R China |
推荐引用方式 GB/T 7714 | Peng, J,Han, YC,Yang, YM,et al. Direct patterning of polymer-based photo luminescent structures with a mask[J]. THIN SOLID FILMS,2004,450(2):329-333. |
APA | Peng, J,Han, YC,Yang, YM,&Li, BY.(2004).Direct patterning of polymer-based photo luminescent structures with a mask.THIN SOLID FILMS,450(2),329-333. |
MLA | Peng, J,et al."Direct patterning of polymer-based photo luminescent structures with a mask".THIN SOLID FILMS 450.2(2004):329-333. |
入库方式: OAI收割
来源:化学研究所
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