中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Direct patterning of polymer-based photo luminescent structures with a mask

文献类型:期刊论文

作者Peng, J; Han, YC; Yang, YM; Li, BY
刊名THIN SOLID FILMS
出版日期2004-03-01
卷号450期号:2页码:329-333
关键词Atomic Force Microscopy Optical Properties Patterning Thin Polymer Film
ISSN号0040-6090
DOI10.1016/j.tsf.2003.09.042
英文摘要We report a simple method to directly pattern polymer-based photo luminescent material, i.e. a prepatterned mask is placed a close distance above it. The final structure is a positive replica of the lateral structures in the mask with submicrometer resolution. The comparison of luminescence efficiency before and after patterning indicates almost no degradation in optical property of the material during the experiments. The mechanism of pattern formation is also discussed. (C) 2003 Elsevier B.V. All rights reserved.
语种英语
WOS记录号WOS:000220442100017
出版者ELSEVIER SCIENCE SA
源URL[http://ir.iccas.ac.cn/handle/121111/55771]  
专题中国科学院化学研究所
通讯作者Han, YC
作者单位Chinese Acad Sci, Changchun Inst Appl Chem, State Key Lab Polymer Phys & Chem, Changchun 130022, Peoples R China
推荐引用方式
GB/T 7714
Peng, J,Han, YC,Yang, YM,et al. Direct patterning of polymer-based photo luminescent structures with a mask[J]. THIN SOLID FILMS,2004,450(2):329-333.
APA Peng, J,Han, YC,Yang, YM,&Li, BY.(2004).Direct patterning of polymer-based photo luminescent structures with a mask.THIN SOLID FILMS,450(2),329-333.
MLA Peng, J,et al."Direct patterning of polymer-based photo luminescent structures with a mask".THIN SOLID FILMS 450.2(2004):329-333.

入库方式: OAI收割

来源:化学研究所

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