Solvent assisted capillary force lithography
文献类型：期刊论文
| 作者 | Yu, XH; Wang, Z; Xing, RB; Luan, SF; Han, YC |
| 刊名 | POLYMER
 |
| 出版日期 | 2005-11-21 |
| 卷号 | 46期号:24页码:11099-11103 |
| 关键词 | Capillary Force Lithography Photolithography Polystyrene |
| ISSN号 | 0032-3861 |
| DOI | 10.1016/j.polymer.2005.09.015 |
| 英文摘要 | Capillary force lithography (CFL) utilizes the capillary-filling phenomenon of a polymeric melt into a cavity to pattern the polymer film coated on a substrate. Most CFL approaches are realized at high temperatures. The solvent-assisted CFL method proposed here realizes patterning at ambient temperature. A swollen PDMS (poly(dimethysilane)) stamp by solvent is placed in contact with a polymer thin film. As the solvent reserved in the PDMS stamp diffuses into the polymer film, the polymer can be dissolved or swollen. Then the capillary force drives the pattern formation. By carefully choosing the experimental conditions, it is possible to produce highly regular and reproducible nano- to micrometer scale polymer patterns using the same microscopic patterned mold. Complex polymer patterns can also be fabricated through the multiple printing. (c) 2005 Elsevier Ltd. All rights reserved. |
| 语种 | 英语 |
| WOS记录号 | WOS:000233144700056 |
| 出版者 | ELSEVIER SCI LTD |
| 源URL | [http://ir.iccas.ac.cn/handle/121111/56963]  |
| 专题 | 中国科学院化学研究所 |
| 通讯作者 | Han, YC |
| 作者单位 | Chinese Acad Sci, Changchun Inst Appl Chem, Grad Sch, State Key Lab Polymer Phys & Chem, Changchun 130022, Peoples R China |
| 推荐引用方式 GB/T 7714 | Yu, XH,Wang, Z,Xing, RB,et al. Solvent assisted capillary force lithography[J]. POLYMER,2005,46(24):11099-11103. |
| APA | Yu, XH,Wang, Z,Xing, RB,Luan, SF,&Han, YC.(2005).Solvent assisted capillary force lithography.POLYMER,46(24),11099-11103. |
| MLA | Yu, XH,et al."Solvent assisted capillary force lithography".POLYMER 46.24(2005):11099-11103. |
入库方式： OAI收割
来源：化学研究所
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