Self-assembled molecular pattern by chemical lithography and interfacial chemical reactions
文献类型：期刊论文
| 作者 | He, Qiang; Tian, Ying; Kueller, Alexander; Grunze, Michael; Goelzhaeuser, Armin; Li, Junbai |
| 刊名 | JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY
 |
| 出版日期 | 2006-06-01 |
| 卷号 | 6期号:6页码:1838-1841 |
| 关键词 | Self-assembly Patterning Chemical Lithography Photoreaction |
| ISSN号 | 1533-4880 |
| DOI | 10.1166/jnn.2006.208 |
| 英文摘要 | The fabrication of lipid-modified molecular patterns by Chemical Lithography combined with interfacial chemical reactions is reported. In this method, self-assembled monolayers (SAMs) of 4'-nitro-1,1'-biphenyl-4-thiol (NBT) were structured by Chemical Lithography which produced cross-linked 4'-amino-1,1'-biphenyl-4-thiol (cABT) monolayers within a nitro-terminated (NBT) matrix. The terminal amino groups in the cABT monolayer were diazotized to create diazo cations, and the lipid monolayer with negative charge was assembled on the diazo regions by electrostatic attraction. Under the exposure of UV light, the photoreaction occurs. The diazonium groups interacting with the lipid headgroups via electrostatic attraction decompose and release N-2 which leads to the lipid monolayer covalently attaching to the cABT region. The presence of phosphorus in X-ray photoelectron spectra (XPS) reveals the binding of the phospholipid layer to the cABT surface. Atomic force microscopy (AFM) images display that lipid-modified molecular patterns with different sizes and shapes and with a thickness of ca. 2.5 nm have been formed. The resulting lipid-modified molecular patterns are considered to be a first step towards obtaining stable biointerfacing patterns and studying biomolecular recognition. |
| 语种 | 英语 |
| WOS记录号 | WOS:000238875900049 |
| 出版者 | AMER SCIENTIFIC PUBLISHERS |
| 源URL | [http://ir.iccas.ac.cn/handle/121111/58591]  |
| 专题 | 中国科学院化学研究所 |
| 通讯作者 | Li, Junbai |
| 作者单位 | 1.Chinese Acad Sci, Inst Chem, Ctr Mol Sci, Int Joint Lab,Key Lab Colloid & Interface Sci, Beijing 100080, Peoples R China 2.Univ Heidelberg, Angew Phys Chem, D-69120 Heidelberg, Germany 3.Univ Bielefeld, Phys Supramol Syst, D-33615 Bielefeld, Germany |
| 推荐引用方式 GB/T 7714 | He, Qiang,Tian, Ying,Kueller, Alexander,et al. Self-assembled molecular pattern by chemical lithography and interfacial chemical reactions[J]. JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY,2006,6(6):1838-1841. |
| APA | He, Qiang,Tian, Ying,Kueller, Alexander,Grunze, Michael,Goelzhaeuser, Armin,&Li, Junbai.(2006).Self-assembled molecular pattern by chemical lithography and interfacial chemical reactions.JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY,6(6),1838-1841. |
| MLA | He, Qiang,et al."Self-assembled molecular pattern by chemical lithography and interfacial chemical reactions".JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY 6.6(2006):1838-1841. |
入库方式： OAI收割
来源：化学研究所
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