中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Preparation and characterization of copper nitride films at various nitrogen contents by reactive radio-frequency magnetron sputtering

文献类型:期刊论文

作者Yuan, XM; Yan, PX; Liu, JZ
刊名MATERIALS LETTERS
出版日期2006-07-01
卷号60期号:15页码:1809-1812
关键词Copper Nitride Film Surface Morphology Electrical Resistivity Optical Energy Gap
ISSN号0167-577X
DOI10.1016/j.matlet.2005.12.028
英文摘要The semiconducting Cu3N films were successfully deposited on glass substrates by reactive radio-frequency magnetron sputtering in a mixture gas of nitrogen and argon. The influence of nitrogen content in a fixed total sputtering gas flow on the preferential crystalline orientation, the mean crystalline grains size, the electrical resistivity, and the optical energy gap of as-deposited films were investigated. X-ray diffraction analysis shows that the films were polycrystalline Cu3N and the preferential orientation is greatly affected by the N-2 content. All the Cu3N films have smooth surfaces with dense and continuous microstructure. The electrical resistivity and the optical energy gap of these as-deposited Cu3N films were measured to be in the range of 1.51 x 10(2)-1.129 x 10(3) Omega cm, and 1.34-1.75 eV, respectively. (c) 2005 Elsevier BY. All rights reserved.
语种英语
WOS记录号WOS:000237158200008
出版者ELSEVIER SCIENCE BV
源URL[http://ir.iccas.ac.cn/handle/121111/60105]  
专题中国科学院化学研究所
通讯作者Yan, PX
作者单位1.Lanzhou Univ, Inst Plasma & Met Mat, Lanzhou 730000, Peoples R China
2.Chinese Acad Sci, Inst Chem & Phys, Key Lab Solid Lubricat, Lanzhou 730000, Peoples R China
推荐引用方式
GB/T 7714
Yuan, XM,Yan, PX,Liu, JZ. Preparation and characterization of copper nitride films at various nitrogen contents by reactive radio-frequency magnetron sputtering[J]. MATERIALS LETTERS,2006,60(15):1809-1812.
APA Yuan, XM,Yan, PX,&Liu, JZ.(2006).Preparation and characterization of copper nitride films at various nitrogen contents by reactive radio-frequency magnetron sputtering.MATERIALS LETTERS,60(15),1809-1812.
MLA Yuan, XM,et al."Preparation and characterization of copper nitride films at various nitrogen contents by reactive radio-frequency magnetron sputtering".MATERIALS LETTERS 60.15(2006):1809-1812.

入库方式: OAI收割

来源:化学研究所

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