Fabrication of thermosensitive polymer nanopatterns through chemical lithography and atom transfer radical polymerization
文献类型:期刊论文
作者 | He, Qiang; Kueller, Alexander; Grunze, Michael; Li, Junbai |
刊名 | LANGMUIR
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出版日期 | 2007-03-27 |
卷号 | 23期号:7页码:3981-3987 |
ISSN号 | 0743-7463 |
DOI | 10.1021/la062793u |
英文摘要 | Micro- and nanopatterns of thermosensitive poly(N-isopropylacrylamide) brush on gold substrate were prepared by using chemical lithography combined with surface-initiated atom transfer radical polymerization. Self-assembled monolayers of 4'-nitro-1, 1'-biphenyl-4-thiol were structured by chemical lithography which produced cross-linked 4'-amino-1,1'-biphenyl-4-thiol monolayer within a nitro-terminated matrix. The terminal amino groups in monolayers were bounded with the surface initiator bromoisobutyryl bromide. After polymerization, the smallest size can reach to 70-nm line width and dots. The thermosensitivity of poly(N-isopropylacrylamide) brushes is demonstrated by contact angle measurement and fluid atomic force microscopy. This fabrication approach allows creating spatially defined polymer patterns and provides a simple and versatile method to construct complex micro- and nanopatterned polymer brushes with spatial and topographic control in a single step. |
语种 | 英语 |
WOS记录号 | WOS:000245012900067 |
出版者 | AMER CHEMICAL SOC |
源URL | [http://ir.iccas.ac.cn/handle/121111/60599] ![]() |
专题 | 中国科学院化学研究所 |
通讯作者 | Li, Junbai |
作者单位 | 1.Chinese Acad Sci, BNLMS, Key Lab Colloid & Interface Sci, Inst Chem, Beijing 100080, Peoples R China 2.Univ Heidelberg, Angew Phys Chem, D-69120 Heidelberg, Germany 3.Univ Maine, Inst Mol Biophys, Orono, ME 04469 USA |
推荐引用方式 GB/T 7714 | He, Qiang,Kueller, Alexander,Grunze, Michael,et al. Fabrication of thermosensitive polymer nanopatterns through chemical lithography and atom transfer radical polymerization[J]. LANGMUIR,2007,23(7):3981-3987. |
APA | He, Qiang,Kueller, Alexander,Grunze, Michael,&Li, Junbai.(2007).Fabrication of thermosensitive polymer nanopatterns through chemical lithography and atom transfer radical polymerization.LANGMUIR,23(7),3981-3987. |
MLA | He, Qiang,et al."Fabrication of thermosensitive polymer nanopatterns through chemical lithography and atom transfer radical polymerization".LANGMUIR 23.7(2007):3981-3987. |
入库方式: OAI收割
来源:化学研究所
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