Formation of ordered microphase-separated pattern during spin coating of ABC triblock copolymer
文献类型：期刊论文
| 作者 | Huang, Weihuan; Luo, Chunxia; Zhang, Jilin; Han, Yanchun |
| 刊名 | JOURNAL OF CHEMICAL PHYSICS
 |
| 出版日期 | 2007-03-14 |
| 卷号 | 126期号:10 |
| ISSN号 | 0021-9606 |
| DOI | 10.1063/1.2710277 |
| 英文摘要 | In this paper, the authors have systematically studied the microphase separation and crystallization during spin coating of an ABC triblock copolymer, polystyrene-b-poly(2-vinylpyridine)-b-poly(ethylene oxide) (PS-b-P2VP-b-PEO). The microphase separation of PS-b-P2VP-b-PEO and the crystallization of PEO blocks can be modulated by the types of the solvent and the substrate, the spinning speed, and the copolymer concentration. Ordered microphase-separated pattern, where PEO and P2VP blocks adsorbed to the substrate and PS blocks protrusions formed hexagonal dots above the P2VP domains, can only be obtained when PS-b-P2VP-b-PEO is dissolved in N,N-dimethylformamide and the films are spin coated onto the polar substrate, silicon wafers or mica. The mechanism of the formation of regular pattern by microphase separation is found to be mainly related to the inducement of the substrate (middle block P2VP wetting the polar substrate), the quick vanishment of the solvent during the early stage of the spin coating, and the slow evaporation of the remaining solvent during the subsequent stage. On the other hand, the probability of the crystallization of PEO blocks during spin coating decreases with the reduced film thickness. When the film thickness reaches a certain value (3.0 nm), the extensive crystallization of PEO is effectively prohibited and ordered microphase-separated pattern over large areas can be routinely prepared. When the film thickness exceeds another definite value (12.0 nm), the crystallization of PEO dominates the surface morphology. For films with thickness between these two values, microphase separation and crystallization can simultaneously occur. (c) 2007 American Institute of Physics. |
| 语种 | 英语 |
| WOS记录号 | WOS:000244895600029 |
| 出版者 | AMER INST PHYSICS |
| 源URL | [http://ir.iccas.ac.cn/handle/121111/62857]  |
| 专题 | 中国科学院化学研究所 |
| 通讯作者 | Huang, Weihuan |
| 作者单位 | 1.Chinese Acad Sci, Changchun Inst Appl Chem, State Key Lab Polymer Phys & Chem, Changchun 130022, Peoples R China 2.Grad Univ Chinese Acad Sci, Changchun 130022, Peoples R China |
| 推荐引用方式 GB/T 7714 | Huang, Weihuan,Luo, Chunxia,Zhang, Jilin,et al. Formation of ordered microphase-separated pattern during spin coating of ABC triblock copolymer[J]. JOURNAL OF CHEMICAL PHYSICS,2007,126(10). |
| APA | Huang, Weihuan,Luo, Chunxia,Zhang, Jilin,&Han, Yanchun.(2007).Formation of ordered microphase-separated pattern during spin coating of ABC triblock copolymer.JOURNAL OF CHEMICAL PHYSICS,126(10). |
| MLA | Huang, Weihuan,et al."Formation of ordered microphase-separated pattern during spin coating of ABC triblock copolymer".JOURNAL OF CHEMICAL PHYSICS 126.10(2007). |
入库方式： OAI收割
来源：化学研究所
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