Iron nitride thin films deposited by chloride assisted plasma enhanced chemical vapour deposition: facile stoichiometry control and mechanism study
文献类型：期刊论文
| 作者 | Zheng, Jie1; Yang, Rong1; Chen, Weimeng2; Xie, Lei1; Li, Xingguo1,3; Chen, Chinping2 |
| 刊名 | JOURNAL OF PHYSICS D-APPLIED PHYSICS
 |
| 出版日期 | 2009-09-21 |
| 卷号 | 42期号:18 |
| ISSN号 | 0022-3727 |
| DOI | 10.1088/0022-3727/42/18/185209 |
| 英文摘要 | A facile method for iron nitride thin film preparation by the plasma enhanced chemical vapour deposition technique using FeCl(2), N(2) and H(2) as starting materials was developed. Iron nitride thin films with different phase structures, including three stoichiometric phases (gamma'-Fe(4)N, epsilon-Fe(3)N and zeta-Fe(2)N) and solid solutions in between could be prepared by this method. Variation of N(2) or H(2) flow, plasma power or FeCl(2) evaporation temperature allowed continuous adjustment of the film stoichiometry. Typical deposition rates of 10-20 nm min(-1) was achieved in typical conditions, much faster than that in most conventional low pressure thin film fabrication methods. This method was also successfully applied to prepare the nitrides of Mn, Co and Ni by simply replacing FeCl(2) with the corresponding metal chlorides. The mechanisms determining film stoichiometry and deposition rate were interpreted by a simple chemical model together with optical emission spectroscopy diagnostics of plasma. |
| 语种 | 英语 |
| WOS记录号 | WOS:000269557000037 |
| 出版者 | IOP PUBLISHING LTD |
| 源URL | [http://ir.iccas.ac.cn/handle/121111/66087]  |
| 专题 | 中国科学院化学研究所 |
| 通讯作者 | Li, Xingguo |
| 作者单位 | 1.Peking Univ, BNLMS, State Key Lab Rare Earth Mat Chem & Applicat, Coll Chem & Mol Engn, Beijing 100871, Peoples R China 2.Peking Univ, Coll Phys, Beijing 100871, Peoples R China 3.Peking Univ, Coll Engn, Beijing 100871, Peoples R China |
| 推荐引用方式 GB/T 7714 | Zheng, Jie,Yang, Rong,Chen, Weimeng,et al. Iron nitride thin films deposited by chloride assisted plasma enhanced chemical vapour deposition: facile stoichiometry control and mechanism study[J]. JOURNAL OF PHYSICS D-APPLIED PHYSICS,2009,42(18). |
| APA | Zheng, Jie,Yang, Rong,Chen, Weimeng,Xie, Lei,Li, Xingguo,&Chen, Chinping.(2009).Iron nitride thin films deposited by chloride assisted plasma enhanced chemical vapour deposition: facile stoichiometry control and mechanism study.JOURNAL OF PHYSICS D-APPLIED PHYSICS,42(18). |
| MLA | Zheng, Jie,et al."Iron nitride thin films deposited by chloride assisted plasma enhanced chemical vapour deposition: facile stoichiometry control and mechanism study".JOURNAL OF PHYSICS D-APPLIED PHYSICS 42.18(2009). |
入库方式： OAI收割
来源：化学研究所
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