Micropatterning of polymeric semiconductor by selective lift-off method using epoxy mold
文献类型：期刊论文
| 作者 | Wang, Zhe1,2; Yu, Xinhong2; Xing, Rubo2; Han, Yanchun2; Takahara, Atsushi1 |
| 刊名 | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
 |
| 出版日期 | 2009-07-01 |
| 卷号 | 27期号:4页码:1958-1962 |
| 关键词 | Elastic Deformation Organic Semiconductors Plastic Deformation Polymer Films Surface Energy |
| ISSN号 | 1071-1023 |
| DOI | 10.1116/1.3167372 |
| 英文摘要 | A simple and efficient method for patterning polymeric semiconductors for applications in the field of organic electronics is proposed. The entire polymer layer, except for the desired pattern, is selectively lifted off from a flat poly(dimethylsiloxane) (PDMS) stamp surface by an epoxy mold with a relief pattern. This is advantageous because the elastic deformation of the PDMS stamp around protrusions of a patterned stamp under pressure can assist the plastic deformation of a polymer film along the pattern edges, yielding large area and high quality patterns, and the PDMS surface has low surface energy, which allows the easy removal of the polymer film. |
| 语种 | 英语 |
| WOS记录号 | WOS:000268535600034 |
| 出版者 | A V S AMER INST PHYSICS |
| 源URL | [http://ir.iccas.ac.cn/handle/121111/66581]  |
| 专题 | 中国科学院化学研究所 |
| 通讯作者 | Wang, Zhe |
| 作者单位 | 1.Kyushu Univ, Inst Mat Chem & Engn, Nishi Ku, Fukuoka 8190395, Japan 2.Acad Sinica, Changchun Inst Appl Chem, State Key Lab Polymer Phys & Chem, Changchun 130022, Peoples R China |
| 推荐引用方式 GB/T 7714 | Wang, Zhe,Yu, Xinhong,Xing, Rubo,et al. Micropatterning of polymeric semiconductor by selective lift-off method using epoxy mold[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B,2009,27(4):1958-1962. |
| APA | Wang, Zhe,Yu, Xinhong,Xing, Rubo,Han, Yanchun,&Takahara, Atsushi.(2009).Micropatterning of polymeric semiconductor by selective lift-off method using epoxy mold.JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B,27(4),1958-1962. |
| MLA | Wang, Zhe,et al."Micropatterning of polymeric semiconductor by selective lift-off method using epoxy mold".JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B 27.4(2009):1958-1962. |
入库方式： OAI收割
来源：化学研究所
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