Effects of Diazonaphthoquinone Groups on Photosensitive Coating
文献类型：期刊论文
| 作者 | Zhou, Haihua1,2; Zou, Yingquan1; Song, Yanlin2 |
| 刊名 | JOURNAL OF APPLIED POLYMER SCIENCE
 |
| 出版日期 | 2010-08-15 |
| 卷号 | 117期号:4页码:2360-2365 |
| 关键词 | Lithography Photosensitive Coating Diazonaphthoquinone Group Novolak Resin Esterification Degree |
| ISSN号 | 0021-8995 |
| DOI | 10.1002/app.32156 |
| 英文摘要 | Diazonaphthoquinone (DNQ)-novolak photosensitive materials are important in lithography. DNQ groups play an important role in the photosensitive coating. However, there are no reports on the relationship between content of DNQ groups and properties of the coating. The properties include alkali resistance, isopropanol resistance, and abrasion resistance, the key factors in lithography. The experimental results show proper content of DNQ groups can ensure higher sensitivity, finer resolution, and better abrasion resistance in lithography. (C) 2010 Wiley Periodicals, Inc. J Appl Polym Sci 117: 2360-2365, 2010 |
| 语种 | 英语 |
| WOS记录号 | WOS:000278886900064 |
| 出版者 | JOHN WILEY & SONS INC |
| 源URL | [http://ir.iccas.ac.cn/handle/121111/69647]  |
| 专题 | 中国科学院化学研究所 |
| 通讯作者 | Zou, Yingquan |
| 作者单位 | 1.Beijing Normal Univ, Coll Chem, Beijing 100875, Peoples R China 2.Chinese Acad Sci, New Mat Lab, Inst Chem, Beijing Natl Lab Mol Sci, Beijing 100190, Peoples R China |
| 推荐引用方式 GB/T 7714 | Zhou, Haihua,Zou, Yingquan,Song, Yanlin. Effects of Diazonaphthoquinone Groups on Photosensitive Coating[J]. JOURNAL OF APPLIED POLYMER SCIENCE,2010,117(4):2360-2365. |
| APA | Zhou, Haihua,Zou, Yingquan,&Song, Yanlin.(2010).Effects of Diazonaphthoquinone Groups on Photosensitive Coating.JOURNAL OF APPLIED POLYMER SCIENCE,117(4),2360-2365. |
| MLA | Zhou, Haihua,et al."Effects of Diazonaphthoquinone Groups on Photosensitive Coating".JOURNAL OF APPLIED POLYMER SCIENCE 117.4(2010):2360-2365. |
入库方式： OAI收割
来源：化学研究所
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