Humidity and temperature effect on frictional properties of mica and alkylsilane monolayer self-assembled on mica
文献类型:期刊论文
作者 | Tian, F; Xiao, XD; Loy, MMT; Wang, C; Bai, CL |
刊名 | LANGMUIR
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出版日期 | 1999-01-05 |
卷号 | 15期号:1页码:244-249 |
ISSN号 | 0743-7463 |
英文摘要 | The effects of humidity and temperature on tribological properties of mica and of the octadecyltriethoxysilane (OTE) monolayer self-assembled on mica are studied by friction force microscopy under controlled environments. As the humidity increases, the friction force is observed to decrease for mica and to increase for OTE at low loads at room temperature. Despite their hydrophobicity, water can penetrate into OTE films to alter their molecular chain ordering and to detach the OTE molecules from the mica substrate. The occurrence of OTE film damage is manifested as a crossover point in the friction force curves. Heating the samples in the temperature range of 20-80 degrees C induces a negligible effect for both mica and OTE in low humidity. However, in high humidity, a distinctive change in friction was found. Most of the heating effect can be understood by a "local humidity" concept although various discrepancies still exist. |
语种 | 英语 |
WOS记录号 | WOS:000077982800037 |
出版者 | AMER CHEMICAL SOC |
源URL | [http://ir.iccas.ac.cn/handle/121111/75531] ![]() |
专题 | 中国科学院化学研究所 |
通讯作者 | Xiao, XD |
作者单位 | 1.Hong Kong Univ Sci & Technol, Dept Phys, Hong Kong, Peoples R China 2.Chinese Acad Sci, Inst Chem, Beijing 100080, Peoples R China |
推荐引用方式 GB/T 7714 | Tian, F,Xiao, XD,Loy, MMT,et al. Humidity and temperature effect on frictional properties of mica and alkylsilane monolayer self-assembled on mica[J]. LANGMUIR,1999,15(1):244-249. |
APA | Tian, F,Xiao, XD,Loy, MMT,Wang, C,&Bai, CL.(1999).Humidity and temperature effect on frictional properties of mica and alkylsilane monolayer self-assembled on mica.LANGMUIR,15(1),244-249. |
MLA | Tian, F,et al."Humidity and temperature effect on frictional properties of mica and alkylsilane monolayer self-assembled on mica".LANGMUIR 15.1(1999):244-249. |
入库方式: OAI收割
来源:化学研究所
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