中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Plasma surface modification of poly(m-aramide) fabric for adhesion improvement to fluorosilicone rubber

文献类型:期刊论文

作者Zhang, Z; Liang, HJ; Hou, XH; Yu, YZ
刊名JOURNAL OF ADHESION SCIENCE AND TECHNOLOGY
出版日期2001
卷号15期号:7页码:809-822
关键词Poly(M-aramide) Fluorosilicone Rubber Plasma Treatment T-peel Strength
ISSN号0169-4243
英文摘要Poly(m-phenylene isophthalamide) fabric is important as a reinforcement for highperformance rubber diaphragms, such as fluorosilicone diaphragms. Because of their low affinities for each other, it is difficult to develop a good adhesion bond between poly(m-aramide) fiber and fluorosilicone rubber. The present study demonstrates that the bond strength between a poly(m-aramide) fabric and fluorosilicone rubber can be improved through N-2 plasma treatment of the fabric in combination with a silane coupling agent. The effectiveness of the treatment is dependent on the gas species, the plasma input power, and the time of exposure. The chemical changes in the fabric surface were studied by X-ray photoelectron spectroscopy (XPS). It turned out that free radicals were formed on the surface after the N-2 plasma treatment, which enabled the bonding of the coupling agent to the fabric surface.
语种英语
WOS记录号WOS:000170733100005
出版者VSP BV
源URL[http://ir.iccas.ac.cn/handle/121111/77677]  
专题中国科学院化学研究所
通讯作者Yu, YZ
作者单位Acad Sinica, Inst Chem, Ctr Mol Sci, Beijing 100080, Peoples R China
推荐引用方式
GB/T 7714
Zhang, Z,Liang, HJ,Hou, XH,et al. Plasma surface modification of poly(m-aramide) fabric for adhesion improvement to fluorosilicone rubber[J]. JOURNAL OF ADHESION SCIENCE AND TECHNOLOGY,2001,15(7):809-822.
APA Zhang, Z,Liang, HJ,Hou, XH,&Yu, YZ.(2001).Plasma surface modification of poly(m-aramide) fabric for adhesion improvement to fluorosilicone rubber.JOURNAL OF ADHESION SCIENCE AND TECHNOLOGY,15(7),809-822.
MLA Zhang, Z,et al."Plasma surface modification of poly(m-aramide) fabric for adhesion improvement to fluorosilicone rubber".JOURNAL OF ADHESION SCIENCE AND TECHNOLOGY 15.7(2001):809-822.

入库方式: OAI收割

来源:化学研究所

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