Effect of chemical treatment on TiO2 particles by IMPS
文献类型：期刊论文
| 作者 | Yin, F; Lin, Y; Lin, RF; Li, XP; Xiao, XR |
| 刊名 | CHINESE JOURNAL OF CHEMISTRY
 |
| 出版日期 | 2002-10-01 |
| 卷号 | 20期号:10页码:978-982 |
| 关键词 | Photodegradation Tio2 Particulate Suspension Photocatalytic Activity Hcl-treatment Imps |
| ISSN号 | 1001-604X |
| 英文摘要 | The photodegradation reaction rate of CHCl3 in TiO2 particulate suspension was improved significanty by HCl-treatment. The effect of HCl-treatment on the photocatalytic activity of TiO2 was studied in a PEC cell by using Intensity-Modulated Photocurrent Spectroscopy (IMPS). The magnitude of photocurrent response and the characteristic frequencies of the upper and lower semicircles in the complex plane of EVES response were analyzed, and the cathodic and anodic reaction processes of photogenerated holes and electrons were discussed. The increases in the cathodic and anodic photocurrent response and in the time constants of both cathodic and anodic reaction processes indicate that HCl-treatment leads to the improvement of the photocatalytic activity of TiO2 and a change of the photocatalytic kinetic mechanism. |
| 语种 | 英语 |
| WOS记录号 | WOS:000178644700010 |
| 出版者 | SCIENCE CHINA PRESS |
| 源URL | [http://ir.iccas.ac.cn/handle/121111/78757]  |
| 专题 | 中国科学院化学研究所 |
| 通讯作者 | Yin, F |
| 作者单位 | Chinese Acad Sci, Inst Chem, Ctr Mol Sci, Beijing 100080, Peoples R China |
| 推荐引用方式 GB/T 7714 | Yin, F,Lin, Y,Lin, RF,et al. Effect of chemical treatment on TiO2 particles by IMPS[J]. CHINESE JOURNAL OF CHEMISTRY,2002,20(10):978-982. |
| APA | Yin, F,Lin, Y,Lin, RF,Li, XP,&Xiao, XR.(2002).Effect of chemical treatment on TiO2 particles by IMPS.CHINESE JOURNAL OF CHEMISTRY,20(10),978-982. |
| MLA | Yin, F,et al."Effect of chemical treatment on TiO2 particles by IMPS".CHINESE JOURNAL OF CHEMISTRY 20.10(2002):978-982. |
入库方式： OAI收割
来源：化学研究所
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