Studies of photosensitive alignment layer based on ladder-like polysilsequioxane liquid-crystal devices using atomic force microscopy/force curve
文献类型：期刊论文
| 作者 | Zhu, CF; Shang, GY; Li, BS; Wang, C; Cui, L; Xie, P; Zhang, RB |
| 刊名 | SURFACE AND INTERFACE ANALYSIS
 |
| 出版日期 | 2003-05-01 |
| 卷号 | 35期号:5页码:459-462 |
| 关键词 | Photosensitive Thin Film Adhesion Force |
| ISSN号 | 0142-2421 |
| DOI | 10.1002/sia.1555 |
| 英文摘要 | Atomic force microscopy (AFM)/force curve measurements were used to study the photochemical process of UV-treated (0, 10, 20, 30 and 60 min) organic thin films that were prepared from azobenzene and cinnamate side-chain co-grafted ladder-like polysilsequioxanes (LPS). The morphological data of the thin films describe the changing process on the surface of the thin film. The statistical results of the adhesion force of the thin films further demonstrate the intermolecular characteristics of the thin films. A photosensitive thin film after UV exposure for 20 min would be a better material with a preferred orientation that can be used to make liquid-crystal devices. Copyright (C) 2003 John Wiley Sons, Ltd. |
| 语种 | 英语 |
| WOS记录号 | WOS:000182909700008 |
| 出版者 | JOHN WILEY & SONS LTD |
| 源URL | [http://ir.iccas.ac.cn/handle/121111/79725]  |
| 专题 | 中国科学院化学研究所 |
| 通讯作者 | Wang, C |
| 作者单位 | Chinese Acad Sci, Inst Chem, Ctr Mol Sci, Beijing 100080, Peoples R China |
| 推荐引用方式 GB/T 7714 | Zhu, CF,Shang, GY,Li, BS,et al. Studies of photosensitive alignment layer based on ladder-like polysilsequioxane liquid-crystal devices using atomic force microscopy/force curve[J]. SURFACE AND INTERFACE ANALYSIS,2003,35(5):459-462. |
| APA | Zhu, CF.,Shang, GY.,Li, BS.,Wang, C.,Cui, L.,...&Zhang, RB.(2003).Studies of photosensitive alignment layer based on ladder-like polysilsequioxane liquid-crystal devices using atomic force microscopy/force curve.SURFACE AND INTERFACE ANALYSIS,35(5),459-462. |
| MLA | Zhu, CF,et al."Studies of photosensitive alignment layer based on ladder-like polysilsequioxane liquid-crystal devices using atomic force microscopy/force curve".SURFACE AND INTERFACE ANALYSIS 35.5(2003):459-462. |
入库方式： OAI收割
来源：化学研究所
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