中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Photo-electric conversion properties of oligo-thiophene carboxylic acid sensitized porous TiO2 films

文献类型:期刊论文

作者Luo, Z; Tan, SX; Zhai, J; Fang, HJ; Li, YL; Jiang, L; Zhu, DB
刊名CHEMICAL JOURNAL OF CHINESE UNIVERSITIES-CHINESE
出版日期2004
卷号25期号:1页码:154-156
关键词Oligo-thiophene Carboxylic Acid Dye Sensitization Porous Tio2 Films Photo-electric Conversion
ISSN号0251-0790
英文摘要TiO2 films with nano-porous structures were obtained by adding the poly-ethylene glycol (PEG) in the TiO2 colloid. Then the as-prepared films were sensitized by the trithiophene carboxylic diacid (TTDA), pentathiophene carboxylic diacid(PTDA), N3[Ru(II)L-2(SCN)(2), L=2,2'-bipyridyl-4,4'-dicarboxylate] dye and the mixture of PTDA and N3 dye, respectively. After fabricating the films into devices, the I-V curves were determined and their photovoltaic properties were studied. The results show that the porous TiO2 films can be sensitized by both TTDA and PTDA effectively, while the film sensitized by the mixture of PTDA and N3 dye has a maximum photo-electric conversion efficiency.
语种英语
WOS记录号WOS:000188470400038
出版者HIGHER EDUCATION PRESS
源URL[http://ir.iccas.ac.cn/handle/121111/82511]  
专题中国科学院化学研究所
通讯作者Jiang, L
作者单位Chinese Acad Sci, Inst Chem, Ctr Mol Sci, Beijing 100080, Peoples R China
推荐引用方式
GB/T 7714
Luo, Z,Tan, SX,Zhai, J,et al. Photo-electric conversion properties of oligo-thiophene carboxylic acid sensitized porous TiO2 films[J]. CHEMICAL JOURNAL OF CHINESE UNIVERSITIES-CHINESE,2004,25(1):154-156.
APA Luo, Z.,Tan, SX.,Zhai, J.,Fang, HJ.,Li, YL.,...&Zhu, DB.(2004).Photo-electric conversion properties of oligo-thiophene carboxylic acid sensitized porous TiO2 films.CHEMICAL JOURNAL OF CHINESE UNIVERSITIES-CHINESE,25(1),154-156.
MLA Luo, Z,et al."Photo-electric conversion properties of oligo-thiophene carboxylic acid sensitized porous TiO2 films".CHEMICAL JOURNAL OF CHINESE UNIVERSITIES-CHINESE 25.1(2004):154-156.

入库方式: OAI收割

来源:化学研究所

浏览0
下载0
收藏0
其他版本

除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。