Surface plasmons superresolution nanolithography technique by using polydimethylsiloxane soft mold based on light coupling
文献类型：期刊论文
| 作者 | He, Chuanwang1,2; Huang, Peng1,2; Fan, Bin1; Dong, Xiaochun1 |
| 刊名 | EUROPEAN PHYSICAL JOURNAL-APPLIED PHYSICS
 |
| 出版日期 | 2018-10-10 |
| 卷号 | 82期号:3页码:30401 |
| 关键词 | Electric fields High frequency amplifiers Microchannels Molds Nanolithography Optical resolving power Polydimethylsiloxane Silver Surface plasmons |
| ISSN号 | 1286-0042 |
| DOI | 10.1051/epjap/2018180184 |
| 文献子类 | J |
| 英文摘要 | We proposed a novel surface plasmons (SP) nanolithography technique based on light coupling, which adopts the polydimethylsiloxane (PDMS) soft mold to replace the ordinary hard mask. By using the light coupling effect of PDMS mold and the SP resonance effect of silver layer, the nanolithography technique could realize the superresolution lithography with a resolution of 1/10 of exposure wavelength and a high contrast ratio of 0.97. By the numerical simulation, we calculated the electric field distribution, analyzed the influence of the linewidth of PDMS soft mold and the thickness of silver layer on the proposed nanolithography system. The calculated results indicate the physics mechanism that the silver layer acts not only as an amplifier for high-frequency energy, but also as a blocker for the low-frequency energy. The optimal linewidth and silver layer thickness are obtained, which can promote the contrast ratio to 0.99. |
| WOS关键词 | NEXT-GENERATION LITHOGRAPHY ; FOCUSED-ION-BEAM ; INTERFERENCE NANOLITHOGRAPHY ; SILVER SUPERLENS ; DEEP-ULTRAVIOLET ; HARD MASK ; 157 NM ; TECHNOLOGY ; RESOLUTION ; LIMITS |
| 语种 | 英语 |
| WOS记录号 | WOS:000447052100001 |
| 源URL | [http://ir.ioe.ac.cn/handle/181551/9276]  |
| 专题 | 光电技术研究所_微电子装备总体研究室（四室） |
| 作者单位 | 1.Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu; 610209, China; 2.University of Chinese Academy of Sciences, Beijing; 100049, China |
| 推荐引用方式 GB/T 7714 | He, Chuanwang,Huang, Peng,Fan, Bin,et al. Surface plasmons superresolution nanolithography technique by using polydimethylsiloxane soft mold based on light coupling[J]. EUROPEAN PHYSICAL JOURNAL-APPLIED PHYSICS,2018,82(3):30401. |
| APA | He, Chuanwang,Huang, Peng,Fan, Bin,&Dong, Xiaochun.(2018).Surface plasmons superresolution nanolithography technique by using polydimethylsiloxane soft mold based on light coupling.EUROPEAN PHYSICAL JOURNAL-APPLIED PHYSICS,82(3),30401. |
| MLA | He, Chuanwang,et al."Surface plasmons superresolution nanolithography technique by using polydimethylsiloxane soft mold based on light coupling".EUROPEAN PHYSICAL JOURNAL-APPLIED PHYSICS 82.3(2018):30401. |
入库方式： OAI收割
来源：光电技术研究所
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