Sensitive measurement of stress birefringence of fused silica substrates with cavity ring-down technique
文献类型：期刊论文
| 作者 | Xiao, Shilei1; Li, Bincheng1; Cui, Hao1,2; Wang, Jing1 |
| 刊名 | OPTICS LETTERS
 |
| 出版日期 | 2018-02-15 |
| 卷号 | 43期号:4页码:843-846 |
| 关键词 | Birefringence Light measurement Substrates |
| ISSN号 | 0146-9592 |
| DOI | 10.1364/OL.43.000843 |
| 文献子类 | J |
| 英文摘要 | A polarized cavity ring-down technique was employed to precisely measure the residual stress birefringence of fused silica substrates with greatly enhanced measurement sensitivity. Intracavity birefringence resulted in beating of two orthogonally resonant modes in a Fabry-Perot cavity. The beating frequency of the ring-down decay was directly related to phase retardation induced by stress birefringence of optical components inside the cavity. For fused silica substrates, measurement reproducibilities of phase retardation of 2.38 x 10(-6) rad and of optical path difference of 2.4 x 10(-4) nm were experimentally achieved. In addition, spatially resolved mapping of stress birefringence of a fused silica substrate was obtained, which was in good agreement with that measured with a commercial stress birefringence measurement instrument. The experimental results demonstrated that cavity ring-down is a sensitive technique for stress birefringence measurements of optical components. (C) 2018 Optical Society of America |
| 语种 | 英语 |
| WOS记录号 | WOS:000425123700055 |
| 源URL | [http://ir.ioe.ac.cn/handle/181551/9391]  |
| 专题 | 光电技术研究所_薄膜光学技术研究室（十一室） |
| 作者单位 | 1.School of Optoelectronic Information, University of Electronic Science and Technology of China, Chengdu; 610054, China; 2.Institute of Optics and Electronics, Chinese Academy of Sciences, Shuangliu, Chengdu; 610209, China |
| 推荐引用方式 GB/T 7714 | Xiao, Shilei,Li, Bincheng,Cui, Hao,et al. Sensitive measurement of stress birefringence of fused silica substrates with cavity ring-down technique[J]. OPTICS LETTERS,2018,43(4):843-846. |
| APA | Xiao, Shilei,Li, Bincheng,Cui, Hao,&Wang, Jing.(2018).Sensitive measurement of stress birefringence of fused silica substrates with cavity ring-down technique.OPTICS LETTERS,43(4),843-846. |
| MLA | Xiao, Shilei,et al."Sensitive measurement of stress birefringence of fused silica substrates with cavity ring-down technique".OPTICS LETTERS 43.4(2018):843-846. |
入库方式： OAI收割
来源：光电技术研究所
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