Simple and rapid particle detection device for substrate surface
文献类型：会议论文
| 作者 | Ai, Lifu; Zhang, Jian; Wang, Changtao; Luo, Xiangang |
| 出版日期 | 2018 |
| 会议日期 | JUN 26-29, 2018JUN 26-29, 2018 |
| 会议地点 | Chengdu, PEOPLES R CHINAChengdu, PEOPLES R CHINA |
| 关键词 | Substrate detection lithography image processing light scattering |
| 卷号 | 10841 |
| DOI | 10.1117/12.2505570 |
| 页码 | 1084106 |
| 英文摘要 | With the rapid development of lithography technology, the processing width of lithography line is up to 10 nm. The tiny defects on the surface of substrate and particles attached to the surface have a great influence on the quality of lithography, especially the surface plasmons lithography, which requires the gap between the substrate and the mask should be controlled within dozens of nanometers, since the surface defects and particles seriously affect the quality of the surface plasmons lithography. Substrate detection device in foreign countries is costly, and the results detected by optical microscopes and electron microscopes can't meet the requirements of the current experiment. Therefore, a set of scattering detection device needs to be developed in order to meet the requirement of the defect detection of the substrate surface. |
| 会议录 | Proceedings of SPIE - 9TH INTERNATIONAL SYMPOSIUM ON ADVANCED OPTICAL MANUFACTURING AND TESTING TECHNOLOGIES (AOMATT 2018): META-SURFACE-WAVE AND PLANAR OPTICS
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| 文献子类 | C |
| 语种 | 英语 |
| ISSN号 | 0277-786X |
| WOS记录号 | WOS:000461820700005 |
| WOS关键词 | SCATTERING |
| 源URL | [http://ir.ioe.ac.cn/handle/181551/9141]  |
| 专题 | 光电技术研究所_微细加工光学技术国家重点实验室（开放室） |
| 推荐引用方式 GB/T 7714 | Ai, Lifu,Zhang, Jian,Wang, Changtao,et al. Simple and rapid particle detection device for substrate surface[C]. 见:. Chengdu, PEOPLES R CHINAChengdu, PEOPLES R CHINA. JUN 26-29, 2018JUN 26-29, 2018. |
入库方式： OAI收割
来源：光电技术研究所
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