Wavefront-aberration measurement and systematic-error analysis of a high numerical-aperture objective
文献类型：期刊论文
| 作者 | Liu, Zhixiang1,2,3; Xing, Tingwen1; Jiang, Yadong2; Lv, Baobin1,2,3 |
| 刊名 | Optical Engineering
 |
| 出版日期 | 2018-02-01 |
| 卷号 | 57期号:2页码:024107 |
| 关键词 | Diffraction Diffraction gratings Interferometers Ray tracing Shearing Systematic errors Wavefronts |
| ISSN号 | 0091-3286 |
| DOI | 10.1117/1.OE.57.2.024107 |
| 文献子类 | J |
| 英文摘要 | A two-dimensional (2-D) shearing interferometer based on an amplitude chessboard grating was designed to measure the wavefront aberration of a high numerical-aperture (NA) objective. Chessboard gratings offer better diffraction efficiencies and fewer disturbing diffraction orders than traditional cross gratings. The wavefront aberration of the tested objective was retrieved from the shearing interferogram using the Fourier transform and differential Zernike polynomial-fitting methods. Grating manufacturing errors, including the duty-cycle and pattern-deviation errors, were analyzed with the Fourier transform method. Then, according to the relation between the spherical pupil and planar detector coordinates, the influence of the distortion of the pupil coordinates was simulated. Finally, the systematic error attributable to grating alignment errors was deduced through the geometrical ray-tracing method. Experimental results indicate that the measuring repeatability (3σ) of the wavefront aberration of an objective with NA 0.4 was 3.4 mλ. The systematic-error results were consistent with previous analyses. Thus, the correct wavefront aberration can be obtained after calibration. © 2018 Society of Photo-Optical Instrumentation Engineers (SPIE). |
| 语种 | 英语 |
| 源URL | [http://ir.ioe.ac.cn/handle/181551/9320]  |
| 专题 | 超精密总体部 |
| 作者单位 | 1.Chinese Academy of Sciences, Institute of Optics and Electronics, Chengdu, China; 2.University of Electronic Science and Technology of China, School of Optoelectronic Science and Engineering, Chengdu, China; 3.University of Chinese Academy of Sciences, Beijing, China |
| 推荐引用方式 GB/T 7714 | Liu, Zhixiang,Xing, Tingwen,Jiang, Yadong,et al. Wavefront-aberration measurement and systematic-error analysis of a high numerical-aperture objective[J]. Optical Engineering,2018,57(2):024107. |
| APA | Liu, Zhixiang,Xing, Tingwen,Jiang, Yadong,&Lv, Baobin.(2018).Wavefront-aberration measurement and systematic-error analysis of a high numerical-aperture objective.Optical Engineering,57(2),024107. |
| MLA | Liu, Zhixiang,et al."Wavefront-aberration measurement and systematic-error analysis of a high numerical-aperture objective".Optical Engineering 57.2(2018):024107. |
入库方式： OAI收割
来源：光电技术研究所
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